Short-wavelength Optics

2000-09--2003-06 Changchun Institute of Optics, Fine Mechanics and Physics doctors degree;
1987-09--1990-03 Changchun Institute of Optics, Fine Mechanics and Physics masters degree;
1983-09--1987-06 Zhejiang University bachelors degree

   

1990-04~~ now: Changchun Institute of Optics, Fine Mechanics and Physics

   

(1) 51.Design and Fabrication of the Multilayer Film of Enhancing Spectral-Purity in Extreme Ultraviolet ,Acta Optica Sinica,2012, Zhu Wenxiu Jin Chunshui, Kuang Shangqi, Yu Bo;
(2) Study on the Off-Axis Illumination for Extreme Ultraviolet Lithography, Acta Optica Sinica, 2012, Wang Jun, Jin Chunshui, Wang Liping, Lu Zengxiong;
(3) Rigorous Vector Analysis of the Effect of Illumination Objective Lens Aberration on the Quality of Far-Field Diffracted Wave Front, Acta Optica Sinica, 2012, Lu Zengxiong, jin Chunshui,Ma Dongmei;
(4) Study of Calibrating Algorithm for Wavefront Reference Source of Point Diffraction Interferometer, Chinese Journal of Lasers, 2012, Zhang Yu Jin Chunshui Ma Dongmei Wang Liping;
(5) Optical Characterization and Structure Properties of Ultraviolet LaF3 Thin Films by Thermal Evaporation, Chinese Journal of Lasers, 2012, Chang Yanhe, Jin Chunshui, Li Chun, Jin Jingcheng;
(6) Characterization of Optical Constants of Ultraviolet LaF3 Films by Thermal Evaporation, Chinese Journal of Lasers, 2012, Chang Yanhe, Jin Chunshui, Li Chun, Jin Jingcheng;
(7) Analysis of air turbulence errors for visible light phase shifting point diffraction interferometer, Infrared and Laser Engineering, 2012, Zhang Yu , Jin Chunshui, Ma Dongmei, Wang Liping ;
(8) Fabrication of solar-blind induced transmission filters by ion-beam sputtering methods, Optics and Precision Engineering,2011, DENG Wen-yuan,JIN Chun-shui;
(9) Diffusion Coefficient Measurement by Grazing Incidence X-ray Reflection in a Mo/Si Multilayer, Chinese Journal of Lasers, 2011, Yu Bo, Li Chun, Jin Chunshui;
(10) EUVL projection lens system the exposure process heat factors, Optics and Precision Engineering,2011, Wang Hui, Wang Liping, Jin Chunshui;
(11) Square optical vortices generated by binary spiral zone plates, Applied Physics Letters, 2011, Nan Gao, Changqing Xie, Chun Li, Chunshui Jin, and Ming Liu;
(12) Gain-phase grating based on spatial modulation of active Raman gain in cold atoms, Physical Review A, 2011, Shang-qi Kuang，Chun-shui Jin, and Chun li;
(13) Testing Method for Optical Supersmooth Substrate Surface by Atomic Force Microscopy, Chinese Journal of Lasers,2011, Jin Jingcheng, Jin Chunshui, Deng Wenyuan, Yu Bo;
(14) Analysis of Effect of Tiny Pinhole Deviation on Far-Field Wave-Front Quality, Acta Optica Sinica, 2011, Lu Zengxiong， Jin Chunshui， Ma Dongmei， Zhang Haitao;
(15) Design of catadioptric omnidirectional imaging system in solar blind UV Optics and Precision Engineering, 2011, WANG Li-ping,Li Chun,JIN Chun-shui;
(16) Optical Properties of Oxide Thin Films for Deep Ultraviolet, Chinese Journal of Lasers,2011, Chang Yanhe; Jin Chunshui; Li Chun; Deng Wenyuan; Kuang Shangqi; Jin Jingcheng;
(17) Characterization of CaF2 Substrates for ArF Excimer Laser, Chinese Journal of Lasers,2011, Deng Wenyuan Jin Chunshui Jin Jingcheng;
(18) Ultraviolet HfO2 thin film by e-beam evaporation and ion beam sputtering
Chinese Journal of Optics and Applied Optics,2010, DENG Wen-yuan,LI Chun,JIN Chun-shui;
(19) Wave-Front Quality Analysis of Three-Dimension Pinhole Vector Diffractional in Extreme Ultraviolet Region, Acta Optica Sinica, 2010
Lu Zengxiong，Jin Chunshui Zhang Lichao Wang Liping;
(20) Fabrication and efficiency measurement of a multilayer-coated ion-beam-etched laminar grating for extreme ultraviolet region, CHINESE OPTICS LETTERS, 2009, Hui Lin, Lichao Zhang, Chunshui Jin, Hongjun Zhou, and Tonglin Huo;
(21) Broadband multilayer-coated normal incidence blazed grating with ~10% diffraction efficiency through the 13–16 nm wavelength region, OPTICS LETTERS, 2009, Lichao Zhang, Hui Lin, Chunshui Jin, Hongjun Zhou, and Tonglin Huo

UV-EUV imaging technology
UV-EUV multilayer coating technology
Ultra-high accuarcy optical testing

    The research of Extreme Ultraviolet Lithography(EUVL) inherited and developed the research strengths of State Key Lab of Applied Optics in the field of short-wave optics. The EUV multilayer technology was taken as research core, and it promoted the developments of the related researches, which formed the foundation of EUV applied technology.
    Recently, for the application of EUV imaging technology in the EUVL system, the research have focused on EUV multilayers, deep sub-nano optical testing, stressless optic mount of EUV reflected mirror, opto-mechanical design and integration of EUV exposure system. Tehe EUV micro-exposure tool is developing for EUV technology evaluation, EUV resist testing, and realy learning at the 22 nm node.

已指导学生

张立超  博士研究生  070207-光学  

金伟华  博士研究生  070207-光学  

刘磊  硕士研究生  070207-光学  

王丽萍  博士研究生  070207-光学  

张宇  博士研究生  070207-光学  

祝文秀  硕士研究生  070207-光学  

卢增雄  博士研究生  070207-光学  

常艳贺  博士研究生  070207-光学  

靳京城  博士研究生  070207-光学  

代晓珂  硕士研究生  070207-光学  

王君  博士研究生  070207-光学  

王珣  博士研究生  070207-光学  

现指导学生

喻波  博士研究生  070207-光学  

陈晨曦阳  硕士研究生  070207-光学  

孙诗壮  硕士研究生  070207-光学  

吴越  硕士研究生  070207-光学  

刘重阳  硕士研究生  070207-光学