基本信息
李思坤  男  硕导  中国科学院上海光学精密机械研究所
电子邮件: lisikun@siom.ac.cn
通信地址: 上海市嘉定区清河路390号
邮政编码: 201800

招生信息

   
招生专业
080300-光学工程
070207-光学
招生方向
高端光刻机技术,光学检测技术
光信息处理技术

教育背景

2006-09--2011-07   四川大学   工学博士学位
2002-09--2006-07   山东理工大学   理学学士学位

工作经历

   
工作简历
2021-12~现在, 中国科学院上海光学精密机械研究所, 研究员
2013-07~2021-11,中科院上海光学精密机械研究所, 副研究员
2011-07~2013-07,中科院上海光学精密机械研究所, 助理研究员
社会兼职
2019-08-31-今,国际先进光刻技术研讨会(iWAPS)组委会委员), 会议组委会委员
2019-01-01-今,上海市科委项目通信评议人,
2015-03-01-今,国家自然科学基金委项目通信评议人,

专利与奖励

   
专利成果
[1] 陈俞光, 李思坤, 唐明, 胡少博, 王向朝. 基于BFGS拟牛顿-内点算法的光刻机匹配方法. CN: CN113189851A, 2021-07-30.
[2] 陈国栋, 李思坤, 王向朝. 基于协方差矩阵自适应进化策略算法的光源掩模优化方法. CN: CN111781804B, 2021-07-27.
[3] 李思坤, 廖陆峰, 王向朝. 用于全芯片光源掩模优化的关键图形筛选方法. CN: CN111624850B, 2021-07-27.
[4] 李思坤, 廖陆峰, 王向朝. 基于轮廓表征的全芯片光源掩模优化关键图形筛选方法. CN: CN111399336B, 2021-07-27.
[5] 廖陆峰, 李思坤, 王向朝. 基于多宽度表征的全芯片光源掩模优化关键图形筛选方法. CN: CN111338179B, 2021-07-06.
[6] 张子南, 李思坤, 王向朝, 成维. 极紫外光刻掩模阴影效应补偿方法. CN: CN111045289B, 2021-07-06.
[7] 李思坤, 陈俞光, 唐明, 王向朝, 陈国栋, 胡少博. 基于协方差矩阵自适应演化策略的光刻机匹配方法. CN: CN112558426A, 2021-03-26.
[8] 李思坤, 茅言杰, 王向朝. 光刻机多参数联合优化方法. CN: CN110554580B, 2021-03-02.
[9] 张子南, 李思坤, 王向朝, 成维, 胡少博, 刘珍. 极紫外光刻光源掩模优化方法. CN: CN112394615A, 2021-02-23.
[10] 廖陆峰, 李思坤, 王向朝. 基于多边形区域表征的全芯片光源掩模优化关键图形筛选方法. CN: CN111929983A, 2020-11-13.
[11] 陈国栋, 李思坤, 王向朝. 基于双采样率像素化掩模图形的快速光学邻近效应修正方法. CN: CN111856872A, 2020-10-30.
[12] 茅言杰, 李思坤, 王向朝. 光刻机匹配方法. CN: CN110320764B, 2020-09-15.
[13] 张子南, 李思坤, 王向朝, 成维. 基于斜入射校正的极紫外光刻掩模衍射谱仿真方法. CN: CN110320763B, 2020-05-05.
[14] 杨朝兴, 王向朝, 李思坤. 光刻机照明系统的微反射镜阵列配置方法. CN: CN108227406B, 2020-04-03.
[15] 成维, 李思坤, 王向朝, 张恒, 孟泽江. 极紫外光刻掩模多层膜相位型缺陷底部形貌检测方法. CN: CN109031894B, 2019-12-20.
[16] 诸波尔, 李思坤, 王向朝, 步扬, 杨朝兴, 唐锋. 光刻投影物镜热像差的快速仿真方法. CN: CN108873615B, 2019-12-03.
[17] 李思坤, 茅言杰, 王向朝, 杨朝兴. 光刻机匹配方法. 中国: CN108170006B, 2019-10-18.
[18] 成维, 李思坤, 王向朝, 张子南. 极紫外光刻掩模多层膜相位型缺陷检测方法. CN: CN110297401A, 2019-10-01.
[19] 管文超, 王向朝, 李思坤, 张恒. 极紫外光刻含相位型缺陷接触孔掩模衍射谱的快速仿真方法. 中国: CN104880915B, 2018.03.20.
[20] 徐东瀛, 李思坤, 王向朝. 小波变换轮廓术抑噪方法. 中国: CN105066905B, 2018.01.12.
[21] 李思坤, 王向朝, 步扬, 茅言杰, 徐东瀛. 光学条纹图背景光成分抑制方法. 中国: CN105426898B, 2018-10-02.
[22] 李思坤, 王向朝, 步扬, 茅言杰, 徐东瀛. 基于非下采样轮廓波变换的光学条纹图抑噪方法. 中国: CN105279744B, 2018-08-14.
[23] 茅言杰, 李思坤, 王向朝. 光刻投影物镜热像差在线预测方法. 中国: CN107121893B, 2018-05-25.
[24] 诸波尔, 李思坤, 王向朝, 张恒, 孟泽江, 步扬. 基于多偏振照明的光刻投影物镜高阶波像差检测方法. 中国: CN108020400A, 2018-05-11.
[25] 张恒, 李思坤, 王向朝, 诸波尔, 孟泽江, 成维. 极紫外光刻三维接触孔掩模衍射谱快速仿真方法. 中国: CN106773546B, 2018-04-13.
[26] 余程, 李思坤, 王向朝. 并行计算光学条纹图相位提取方法. 中国: CN103729251B, 2017-12-15.
[27] 王磊, 王向朝, 李思坤, 杨朝兴. 光刻机掩模的优化方法. 中国: CN105573066B, 2017-12-12.
[28] 李思坤, 王向朝, 徐东瀛. 一种光束准直性检测方法. 中国: CN104406702B, 2017-10-20.
[29] 沈丽娜, 王向朝, 李思坤, 闫观勇, 诸波尔, 张恒, 孟泽江. 光刻机投影物镜偏振像差原位检测方法. 中国: CN105319869A, 2016.02.10.
[30] 诸波尔, 李思坤, 王向朝, 闫观勇, 沈丽娜, 张恒, 孟泽江. 光刻投影物镜高阶波像差检测标记和检测方法. 中国: CN105629677A, 2016-06-01.
[31] 诸波尔, 李思坤, 王向朝, 闫观勇, 沈丽娜, 孟泽江, 张恒. 基于快速建模的大数值孔径光刻投影物镜波像差检测方法. 中国: CN105372948A, 2016-03-02.
[32] 诸波尔, 李思坤, 王向朝, 闫观勇, 沈丽娜, 王磊. 一种大数值孔径光刻机投影物镜波像差检测方法. 中国: CN104777718A, 2015.07.15.
[33] 管文超, 王向朝, 李思坤, 刘晓雷. 极紫外光刻掩模多层膜振幅型缺陷衍射谱的快速仿真方法. 中国: CN104730867A, 2015.06.24.
[34] 闫观勇, 李思坤, 王向朝. 一种用于光刻机的光源掩模优化方法. 中国: CN104714372A, 2015-06-17.
[35] 刘晓雷, 李思坤, 王向朝, 步扬, 管文超. 极紫外光刻含缺陷掩模衍射谱的快速严格仿真方法. 中国: CN104238282A, 2014.12.24.
[36] 王磊, 王向朝, 李思坤, 闫观勇, 杨朝兴. 一种光刻机光源的优化方法. 中国: CN104155852A, 2014-11-19.
[37] 余程, 李思坤, 王向朝. 基于GPU并行计算小波变换的光学条纹图相位提取方法. 中国: CN103983212A, 2014-08-13.
[38] 闫观勇, 李思坤, 王向朝, 沈丽娜, 刘晓雷. 光刻机投影物镜波像差检测标记和检测方法. 中国: CN103955117A, 2014-07-30.
[39] 李兆泽, 李思坤, 王向朝. 光刻机光源与掩模的联合优化方法. 中国: CN103926802A, 2014-07-16.
[40] 杨朝兴, 王向朝, 李思坤. 光刻机照明光源的描述方法. 中国: CN103926803A, 2014-07-16.
[41] 沈丽娜, 王向朝, 李思坤, 闫观勇. 光刻物镜奇像差原位检测方法. 中国: CN103744270A, 2014-04-23.
[42] 李思坤, 王向朝, 杨济硕, 闫冠勇, 李兆泽. 光刻投影物镜波像差和成像最佳焦面的检测方法. 中国: CN103744269A, 2014-04-23.
[43] 刘晓雷, 李思坤, 王向朝, 步扬. 极紫外光刻无缺陷掩模衍射谱快速严格仿真方法. 中国: CN103617309A, 2014-03-05.
[44] 杨济硕, 王向朝, 李思坤, 闫观勇, 诸波尔. 基于相位环空间像主成分分析的投影物镜波像差检测方法. 中国: CN103217871A, 2013-07-24.
[45] 刘晓雷, 李思坤, 王向朝, 步扬. 极紫外光刻厚掩模缺陷的快速仿真方法. 中国: CN103197503A, 2013-07-10.
[46] 李思坤, 王向朝, 步扬, 刘晓雷. 三维信息光学加密系统和方法. 中国: CN103093492A, 2013-05-08.

出版信息

   
发表论文
[1] Zhang, Zinan, Li, Sikun, Wang, Xiangzhao, Cheng, Wei. Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling. OPTICS EXPRESS[J]. 2021, 29(14): 22778-22795, [2] Xiao, YongLiang, Li, Sikun, Situ, Guohai, You, Zhisheng. Unitary learning for diffractive deep neural network. OPTICS AND LASERS IN ENGINEERING[J]. 2021, 139: 1111-111112, [3] Fang, Wu, Yang, Bu, ZhiFan, Liu, ShaoQing, Wang, SiKun, Li, XiangZhao, Wang. Design and analysis of bilayer metallic grating polarizer in deep ultraviolet band. ACTA PHYSICA SINICA[J]. 2021, 70(4): 1111-11111, [4] Zhang, Zinan, Li, Sikun, Wang, Xiangzhao, Cheng, Wei, Qi, Yuejing. Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm. OPTICS EXPRESS[J]. 2021, 29(4): 5448-5465, [5] Chen, Guodong, Li, Sikun, Wang, Xiangzhao. Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling. OPTICS EXPRESS[J]. 2021, 29(11): 17440-17463, [6] Zhang, Zinan, Li, Sikun, Wang, Xiangzhao, Cheng, Wei. Fast mask model for extreme ultraviolet lithography with a slanted absorber sidewall. APPLIED OPTICS[J]. 2021, 60(20): 5776-5782, [7] Cheng, Wei, Li, Sikun, Wang, Xiangzhao, Zhang, Zinan. Extreme ultraviolet phase defect characterization based on complex amplitudes of the aerial images. APPLIED OPTICS[J]. 2021, 60(17): 5208-5219, [8] Chen, Guodong, Li, Sikun, Wang, Xiangzhao. Source mask optimization using the covariance matrix adaptation evolution strategy. OPTICS EXPRESS[J]. 2020, 28(22): 33371-33389, [9] Zhang, Zinan, Li, Sikun, Wang, Xiangzhao, Cheng, Wei. Fast rigorous mask model for extreme ultraviolet lithography. APPLIED OPTICS[J]. 2020, 59(24): 7376-7389, [10] 成维, 李思坤, 王向朝, 张子南. 极紫外光刻掩模相位型缺陷的形貌重建方法. 光学学报[J]. 2020, 40(10): 14-28, [11] Liao, Lufeng, Li, Sikun, Wang, Xiangzhao, Zhang, Libin, Gao, Pengzheng, Wei, Yayi, Shi, Weijie. Critical pattern selection method for full-chip source and mask optimization. OPTICS EXPRESS[J]. 2020, 28(14): 20748-20763, [12] Liu, Zhifan, Yang, Chaoxing, Bu, Yang, Li, Sikun, Zhang, Jianhua, Wang, Xiangzhao, Sun, Gang. Micromirror array allocation algorithm based on deconvolution. APPLIED OPTICS[J]. 2020, 59(12): 3582-3588, [13] Xiao, YongLiang, Wen, Yongfu, Li, Sikun, Zhang, Qican, Zhong, Jianxin. Large-scale structured light 3D shape measurement with reverse photography. OPTICS AND LASERS IN ENGINEERING[J]. 2020, 130: [14] 廖陆峰, 李思坤, 王向朝, 张利斌, 张双, 高澎铮, 韦亚一, 施伟杰. 基于衍射谱分析的全芯片光源掩模联合优化关键图形筛选. 光学学报[J]. 2020, 40(21): 126-136, [15] Mao, Yanjie, Li, Sikun, Sun, Gang, Duan, Lifeng, Shi, Weijie, Bu, Yang, Wang, Xiangzhao. Predictor of thermal aberrations via particle filter for online compensation. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2019, 18(1): [16] 孟泽江, 李思坤, 王向朝, 步扬, 戴凤钊, 杨朝兴. 穆勒矩阵成像椭偏仪误差源的简化分析方法. 光学学报[J]. 2019, 148-159, [17] Meng, Zejiang, Li, Sikun, Wang, Xiangzhao, Bu, Yang, Wang, Jian, Ni, Sheng, Yang, Chaoxing, Mao, Yanjie. Jones pupil metrology of lithographic projection lens and its optimal configuration in the presence of error sources. OPTICS EXPRESS[J]. 2019, 27(4): 4629-4647, [18] Zhu, Boer, Li, Sikun, Wang, Xiangzhao, Meng, Zejiang, Zhang, Heng, Dai, Fengzhao, Tang, Feng, Duan, Lifeng. High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix. OPTICS COMMUNICATIONS[J]. 2019, 431: 158-166, [19] 孟泽江, 李思坤, 王向朝, 步扬, 杨朝兴. 光刻投影物镜的琼斯光瞳检测方法. 光学学报[J]. 2019, 199-209, [20] Zhang, Heng, Li, Sikun, Wang, Xiangzhao, Yang, Chaoxing, Cheng, Wei. Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy (vol 17, 043505, 2018). JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2019, 18(1): [21] Zhang, Heng, Li, Sikun, Wang, Xiangzhao, Meng, Zejiang, Cheng, Wei. Fast optimization of defect compensation and optical proximity correction for extreme ultraviolet lithography mask. OPTICS COMMUNICATIONS[J]. 2019, 452: 169-180, [22] 孟泽江, 李思坤, 王向朝, 步扬, 杨朝兴, 戴凤钊. 基于差分空间像主成分分析的偏振像差检测方法. 光学学报[J]. 2019, 39(7): 150-158, [23] Zhu, Boer, Li, Sikun, Mao, Yanjie, Wang, Xiangzhao, Bu, Yang, Wang, Jian, Sun, Gang, Duan, Lifeng. Fast thermal aberration model for lithographic projection lenses. OPTICS EXPRESS[J]. 2019, 27(23): 34039-34050, [24] Xiao, YongLiang, Li, Sikun, Zhang, Qican, Zhong, Jianxin, Su, Xianyu, You, Zhisheng. Optical fringe-reflection deflectometry with sparse representation. OPTICS AND LASERS IN ENGINEERING[J]. 2018, 104: 62-70, [25] Mao, Yanjie, Li, Sikun, Sun, Gang, Duan, Lifeng, Bu, Yang, Wang, Xiangzhao. Modeling and optimization of lens heating effect for lithographic projector. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2018, 17(2): [26] Xiao, YongLiang, Li, Sikun, Zhang, Qican, Zhong, Jianxin, Su, Xianyu, You, Zhisheng. Optical fringe-reflection deflectometry with bundle adjustment. OPTICS AND LASERS IN ENGINEERING[J]. 2018, 105: 132-140, http://www.corc.org.cn/handle/1471x/1908225.
[27] Kamagara, Abel, Wang, Xiangzhao, Li, Sikun. Nonlinear gamma correction via normed bicoherence minimization in optical fringe projection metrology. OPTICAL ENGINEERING[J]. 2018, 57(3): [28] 张恒, 李思坤, 王向朝. 基于改进型结构分解的极紫外光刻掩模衍射谱快速仿真方法. 光学学报[J]. 2018, 38(1): 0105001-1, [29] Zhang Heng, Li Sikun, Wang Xiangzhao. A Rapid Simulation Method for Diffraction Spectra of EUV Lithography Mask Based on Improved Structural Decomposition. ACTA OPTICA SINICA[J]. 2018, 38(1): [30] Kamagara, Abel, Wang, Xiangzhao, Li, Sikun. Towards gamma-effect elimination in phase measurement profilometry. OPTIK[J]. 2018, 172: 1089-1099, [31] 张恒, 李思坤, 王向朝, 成维. 基于机器学习校正的极紫外光刻含缺陷掩模仿真方法. 光学学报[J]. 2018, 38(12): 303-310, http://lib.cqvip.com/Qikan/Article/Detail?id=6100133842.
[32] Zhang, Heng, Li, Sikun, Wang, Xiangzhao, Yang, Chaoxing, Cheng, Wei. Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2018, 17(4): [33] Kamagara, Abel, Wang, Xiangzhao, Li, Sikun. Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry. APPLIED OPTICS[J]. 2017, 56(28): 8014-8022, [34] 王磊, 李思坤, 王向朝, 杨朝兴. 基于粒子群优化算法的光刻机光源掩模投影物镜联合优化方法. 光学学报[J]. 2017, 37(10): 1022001-1, [35] 诸波尔, 王向朝, 李思坤, 孟泽江, 张恒, 戴凤钊, 段立峰. 超高NA光刻投影物镜高阶波像差检测方法. 光学学报[J]. 2017, 37(4): 0412003-1, [36] Kamagara, Abel, Wang, Xiangzhao, Li, Sikun. Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry. Appl. Optics[J]. 2017, 56(28): 8014-, [37] 杨朝兴, 李思坤, 王向朝. Source Mask Optimization Based on Dynamic Fitness Function. 光学学报[J]. 2016, 36(1): 111006-, [38] 杨朝兴, 李思坤, 王向朝. Pixelated Source Mask Optimization Based on Multi Chromosome Genetic Algorithm. 光学学报[J]. 2016, 36(8): 811001-, http://ir.siom.ac.cn/handle/181231/28517.
[39] Zhu, Boer, Shen, Lina, Wang, Xiangzhao, Li, Sikun, Yan, Guanyong, Zhang, Heng. General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination. J. Opt. Soc. Am. A-Opt. Image Sci. Vis.[J]. 2016, 33(6): 1112-, [40] Li, Sikun, Wang, Xiangzhao, Tang, Feng, Bu, Yang, Sasaki, Osami. Nonsubsampled contourlet transform method for optical fringe pattern analysis in profilometry and interferometry. Appl. Optics[J]. 2016, 55(27): 7718-, [41] Li, Sikun, Wang, Xiangzhao. Radial period extraction method employing frequency measurement for quantitative collimation testing. Opt. Commun.[J]. 2016, 358: 164-, [42] 杨朝兴, 李思坤, 王向朝. Pixelated Source Mask Optimization Based on Multi Chromosome Genetic Algorithm. 光学学报[J]. 2016, 36(8): 811001-, [43] 张恒, 李思坤, 王向朝. 基于分离变量法的极紫外光刻三维掩模快速仿真方法. 第十六届全国光学测试学术交流会摘要集null. 2016, [44] Li, Sikun, Wang, Xiangzhao, Tang, Feng, Bu, Yang, Sasaki, Osami. Nonsubsampled contourlet transform method for optical fringe pattern analysis in profilometry and interferometry. APPLIED OPTICS[J]. 2016, 55(27): 7718-7725, [45] Wang, Lei, Li, Sikun, Wang, Xiangzhao, Yan, Guanyong, Yang, Chaoxing. Pixelated source optimization for optical lithography via particle swarm optimization. J. Micro-Nanolithogr. MEMS MOEMS[J]. 2016, 15(1): http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000374540300008&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=3a85505900f77cc629623c3f2907beab.
[46] Shen, Lina, Wang, Xiangzhao, Li, Sikun, Yan, Guanyong, Zhu, Boer, Zhang, Heng. General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION[J]. 2016, 33(6): 1112-1119, [47] Zhu, Boer, Wang, Xiangzhao, Li, Sikun, Yan, Guanyong, Shen, Lina, Duan, Lifeng. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image. APPLIED OPTICS[J]. 2016, 55(12): 3192-3198, https://www.webofscience.com/wos/woscc/full-record/WOS:000374388600043.
[48] Li, Sikun, Wang, Xiangzhao. Radial period extraction method employing frequency measurement for quantitative collimation testing. OPTICS COMMUNICATIONS[J]. 2016, 358: 164-168, [49] Wang, Lei, Li, Sikun, Wang, Xiangzhao, Yan, Guanyong, Yang, Chaoxing. Pixelated source optimization for optical lithography via particle swarm optimization. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2016, 15(1): [50] 杨朝兴, 李思坤, 王向朝. Source Mask Optimization Based on Dynamic Fitness Function. 光学学报[J]. 2016, 36(1): 111006-, [51] Zhu, Boer, Wang, Xiangzhao, Li, Sikun, Yan, Guanyong, Shen, Lina, Duan, Lifeng. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image. Appl. Optics[J]. 2016, 55(12): 3192-, [52] 沈丽娜, 李思坤, 王向朝, 闫观勇. 投影物镜偏振像差对光刻成像质量影响的解析分析方法. 光学学报[J]. 2015, 35(6): 611003-, [53] 刘晓雷, 王向朝, 李思坤. 极紫外光刻含缺陷掩模仿真模型及缺陷的补偿. 光学学报[J]. 2015, 35(8): 822006-, [54] Liu, Xiaolei, Li, Sikun, Wang, Xiangzhao, Zhang, Heng. Optimal shift of pattern shifting for mitigation of mask defects in extreme ultraviolet lithography. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B[J]. 2015, 33(5): https://www.webofscience.com/wos/woscc/full-record/WOS:000361833200026.
[55] 王向朝, 刘晓雷, 李思坤. 基于等效膜层法的极紫外光刻含缺陷掩模多层膜仿真模型. 光学学报[J]. 2015, 35(6): 622005-, [56] Wang, Lei, Li, Sikun, Wang, Xiangzhao, Yan, Guanyong, Yang, Chaoxing. Source Optimization using Particle Swarm Optimization Algorithm in Photolithography. OPTICAL MICROLITHOGRAPHY XXVIII[J]. 2015, [[[9426]]]: [[[]]]-, [57] 王磊, 李思坤, 王向朝, 闫观勇, 杨朝兴. 基于粒子群优化算法的光刻机光源优化方法. 光学学报[J]. 2015, 35(4): 422002-, [58] Li, Sikun, Wang, Xiangzhao, Yang, Jishuo, Duan, Lifeng, Tang, Feng, Yan, Guanyong. In situ aberration measurement method using a phase-shift ring mask. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2015, 14(1): [59] Shen, Lina, Li, Sikun, Wang, Xiangzhao, Yan, Guanyong. Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality. Optical microlithography xxviiinull. 2015, http://ir.siom.ac.cn/handle/181231/17233.
[60] Shen, Lina, Li, Sikun, Wang, Xiangzhao, Yan, Guanyong. Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2015, 14(4): [61] Li, Jie, Tang, Feng, Wang, Xiangzhao, Dai, Fengzhao, Feng, Peng, Li, Sikun. Wavefront reconstruction for lateral shearing interferometry based on difference polynomial fitting. JOURNAL OF OPTICS[J]. 2015, 17(6): [62] Liu, Xiaolei, Wang, Xiangzhao, Li, Sikun, Yan, Guanyong, Erdmann, Andreas. Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2014, 13(3): [63] Yan, Guanyong, Wang, Xiangzhao, Li, Sikun, Yang, Jishuo, Xu, Dongbo, Erdmann, Andreas. Aberration measurement technique based on an analytical linear model of a through-focus aerial image. OPTICS EXPRESS[J]. 2014, 22(5): 5623-5634, [64] Yan, Guanyong, Wang, Xiangzhao, Li, Sikun, Yang, Jishuo, Xu, Dongbo. Aberration measurement based on principal component analysis of aerial images of optimized marks. OPTICS COMMUNICATIONS[J]. 2014, 329: 63-68, [65] 李兆泽, 李思坤, 王向朝. 基于随机并行梯度速降算法的光刻机光源与掩模联合优化方法. 光学学报[J]. 2014, 34(9): 911002-, [66] 刘晓雷, 李思坤, 王向朝. 极紫外光刻含缺陷多层膜衍射谱仿真简化模型. 光学学报[J]. 2014, 34(9): 905002-, [67] Yang, Chaoxing, Li, Sikun, Wang, Xiangzhao. Efficient source mask optimization using multipole source representation. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2014, 13(4): https://www.webofscience.com/wos/woscc/full-record/WOS:000343072500008.
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发表著作
(1) 集成电路与光刻机, 科学出版社, 2020-08, 第 3 作者
(2) 光刻机像质检测技术, 科学出版社, 2021-03, 第 2 作者

科研活动

   
科研项目
( 1 ) 提高小波变换条纹图像处理技术精度和速度的方法, 主持, 国家级, 2013-01--2015-12
( 2 ) 极紫外光刻掩模缺陷计算补偿方法, 参与, 国家级, 2015-01--2018-12
( 3 ) EUVL三维厚掩模衍射成像建模与仿真研究, 主持, 国家级, 2012-01--2015-12
( 4 ) 基于空间像矢量分析的偏振像差在线检测与像质优化方法, 参与, 国家级, 2013-04--2016-12
( 5 ) 光刻机光源与掩模联合优化理论与方法, 主持, 院级, 2015-12--2016-12
( 6 ) 光刻过程中的透镜热效应仿真理论与方法, 主持, 院级, 2015-12--2016-12
( 7 ) 面向10nm及更小节点集成电路制造的全芯片光刻多参数协同优化方法研究, 主持, 省级, 2017-05--2020-04
( 8 ) 光刻工艺窗口优化与控制工程模型研发, 主持, 国家级, 2017-01--2020-12
( 9 ) DSAXXXX技术研究, 主持, 国家级, 2021-04--2023-03
参与会议
(1)光刻仿真技术及其应用   第十六届全国激光技术与光电子学学术会议   2021-06-03
(2)光刻仿真技术及其在波像差检测中的应用   机器视觉与智能光电检测技术及应用研讨会   2021-05-20
(3)Computational lithography: modeling and performance enhancement techniques for lithographic imaging   International conference onoptical and photonic engimeering   2019-07-16
(4)Ptrfivyion of lens heating induced aberration via particle filter in optical lithography   SPIE Advanced Lithography 2018   2018-02-25
(5)The thermal aberration analysis of a lithography projection lens   SPIE Advanced Lithography 2017   2017-02-26
(6)Pixel-based mask optimization via particle swarm optimization algorithm for inverse lithography   SPIE Advanced Lithography 2016   2016-02-23
(7)Optimal shift of pattern shifting for mitigation of mask defects in extreme ultraviolet lithography   2015 international workshop on EUV Lithography   Sikun Li, Xiangzhao Wang, Xiaolei Liu, et al   2015-06-22
(8)Source Optimization using Particle Swarm Optimization Algorithm in Photolithography   SPIE Advanced Lithography   Lei Wang, Sikun Li, Xiangzhao Wang, Guanyong Yan, Chaoxing Yang    2015-02-22
(9)A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask   SPIE Advanced Lithography   Sikun Li, Xiangzhao Wang , JishuoYang, Feng Tang, Guanyong Yan, Andreas Erdmann   2014-02-23
(10)Source representation for SMO using genetic algorithm   10th Fraunhofer IISB Lithography Simulation Workshop   Xiangzhao Wang, Sikun Li, C. Yang, G. Yan   2013-09-26
(11)Research on in situ aberration measurement of lithographic projection lenses   11th Fraunhofer IISB Lithography Simulation Workshop   Xiangzhao Wang, Sikun Li, L. Duan, J. Yang, and G. Yan   2012-09-20

指导学生

已指导学生

张恒  博士研究生  080300-光学工程  

陈国栋  博士研究生  080300-光学工程  

现指导学生

杨欣华  硕士研究生  080300-光学工程  

雷威  硕士研究生  080300-光学工程  

张涛  硕士研究生  085400-电子信息  

江一鹏  硕士研究生  080300-光学工程  

潘东超  硕士研究生  080300-光学工程  

张子南  博士研究生  080300-光学工程  

廖陆峰  博士研究生  080300-光学工程  

成维  博士研究生  080300-光学工程