发表论文
[1] 中国激光. 2024, 通讯作者 [2] 光学学报. 2024, 通讯作者 [3] 中国激光. 2024, 通讯作者 [4] 光学学报. 2023, 通讯作者 [5] Applied Optics. 2023, 通讯作者 [6] Applied Optics. 2023, 通讯作者 [7] Applied Optics. 2023, 通讯作者 [8] 光学学报. 2023, 通讯作者 [9] 光学学报. 2023, 通讯作者 [10] Applied Optics. 2023, 第 3 作者[11] 陈国栋, 张子南, 李思坤, 王向朝. 深紫外计算光刻技术研究. 激光与光电子学进展[J]. 2022, 第 3 作者59(9): 93-111, http://lib.cqvip.com/Qikan/Article/Detail?id=7107426686.[12] 杨欣华, 李思坤, 廖陆峰, 张利斌, 张双, 张生睿, 施伟杰, 韦亚一, 王向朝. 基于深度优先搜索的全芯片光源掩模优化关键图形筛选方法. 光学学报[J]. 2022, 第 2 作者42(10): 202-211, http://lib.cqvip.com/Qikan/Article/Detail?id=7107420069.[13] 施伟杰, 俞宗强, 蒋俊海, 车永强, 李思坤. 芯片制造语境下的计算光刻技术. 激光与光电子学进展[J]. 2022, 第 5 作者59(9): 1-14, http://lib.cqvip.com/Qikan/Article/Detail?id=7107426681.[14] Cheng, Wei, Li, Sikun, Wang, Xiangzhao, Zhang, Zinan. Through-focus EUV multilayer defect compensation considering optical proximity correction. APPLIED OPTICS[J]. 2022, 第 2 作者 通讯作者 61(15): 4437-4448, http://dx.doi.org/10.1364/AO.458059.[15] 廖陆峰, 李思坤, 张子南, 王向朝. 光源掩模联合优化技术研究. 激光与光电子学进展[J]. 2022, 第 2 作者59(9): 177-196, http://lib.cqvip.com/Qikan/Article/Detail?id=7107426689.[16] 张子南, 李思坤, 王向朝. EUV光刻三维掩模成像研究进展. 激光与光电子学进展[J]. 2022, 第 2 作者59(9): 345-366, http://lib.cqvip.com/Qikan/Article/Detail?id=7107426700.[17] 冯鹏, 李中梁, 王向朝, 步扬, 卢云君, 郭福东, 李思坤. 偏振相移点衍射干涉波像差检测技术研究. 中国激光[J]. 2022, 第 7 作者[18] 成维, 李思坤, 张子南, 王向朝. 极紫外光刻掩模缺陷检测与补偿技术研究. 激光与光电子学进展[J]. 2022, 第 2 作者59(9): 367-380, http://lib.cqvip.com/Qikan/Article/Detail?id=7107426701.[19] Zhang, Zinan, Li, Sikun, Wang, Xiangzhao, Cheng, Wei. Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling. OPTICS EXPRESS[J]. 2021, 第 2 作者 通讯作者 29(14): 22778-22795, [20] Xiao, YongLiang, Li, Sikun, Situ, Guohai, You, Zhisheng. Unitary learning for diffractive deep neural network. OPTICS AND LASERS IN ENGINEERING[J]. 2021, 第 2 作者 通讯作者 139: 1111-111112, [21] Fang, Wu, Yang, Bu, ZhiFan, Liu, ShaoQing, Wang, SiKun, Li, XiangZhao, Wang. Design and analysis of bilayer metallic grating polarizer in deep ultraviolet band. ACTA PHYSICA SINICA[J]. 2021, 第 5 作者70(4): 1111-11111, [22] 吴芳, 步扬, 刘志帆, 王少卿, 李思坤, 王向朝. 深紫外双层金属光栅偏振器的设计与分析. 物理学报[J]. 2021, 第 5 作者70(4): 178-188, https://wulixb.iphy.ac.cn/cn/article/doi/10.7498/aps.70.20201403.[23] Zhang, Zinan, Li, Sikun, Wang, Xiangzhao, Cheng, Wei, Qi, Yuejing. Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm. OPTICS EXPRESS[J]. 2021, 第 2 作者 通讯作者 29(4): 5448-5465, [24] Chen, Guodong, Li, Sikun, Wang, Xiangzhao. Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling. OPTICS EXPRESS[J]. 2021, 第 2 作者 通讯作者 29(11): 17440-17463, [25] Zhang, Zinan, Li, Sikun, Wang, Xiangzhao, Cheng, Wei. Fast mask model for extreme ultraviolet lithography with a slanted absorber sidewall. APPLIED OPTICS[J]. 2021, 第 2 作者 通讯作者 60(20): 5776-5782, [26] Cheng, Wei, Li, Sikun, Wang, Xiangzhao, Zhang, Zinan. Extreme ultraviolet phase defect characterization based on complex amplitudes of the aerial images. APPLIED OPTICS[J]. 2021, 第 2 作者 通讯作者 60(17): 5208-5219, [27] Chen, Guodong, Li, Sikun, Wang, Xiangzhao. Source mask optimization using the covariance matrix adaptation evolution strategy. OPTICS EXPRESS[J]. 2020, 第 2 作者 通讯作者 28(22): 33371-33389, [28] Zhang, Zinan, Li, Sikun, Wang, Xiangzhao, Cheng, Wei. Fast rigorous mask model for extreme ultraviolet lithography. APPLIED OPTICS[J]. 2020, 第 2 作者59(24): 7376-7389, [29] 成维, 李思坤, 王向朝, 张子南. 极紫外光刻掩模相位型缺陷的形貌重建方法. 光学学报[J]. 2020, 第 2 作者40(10): 14-28, [30] Liao, Lufeng, Li, Sikun, Wang, Xiangzhao, Zhang, Libin, Gao, Pengzheng, Wei, Yayi, Shi, Weijie. Critical pattern selection method for full-chip source and mask optimization. OPTICS EXPRESS[J]. 2020, 第 2 作者 通讯作者 28(14): 20748-20763, [31] Liu, Zhifan, Yang, Chaoxing, Bu, Yang, Li, Sikun, Zhang, Jianhua, Wang, Xiangzhao, Sun, Gang. Micromirror array allocation algorithm based on deconvolution. APPLIED OPTICS[J]. 2020, 第 4 作者59(12): 3582-3588, [32] Xiao, YongLiang, Wen, Yongfu, Li, Sikun, Zhang, Qican, Zhong, Jianxin. Large-scale structured light 3D shape measurement with reverse photography. OPTICS AND LASERS IN ENGINEERING[J]. 2020, 第 3 作者130: [33] 廖陆峰, 李思坤, 王向朝, 张利斌, 张双, 高澎铮, 韦亚一, 施伟杰. 基于衍射谱分析的全芯片光源掩模联合优化关键图形筛选. 光学学报[J]. 2020, 第 2 作者40(21): 126-136, [34] Mao, Yanjie, Li, Sikun, Sun, Gang, Duan, Lifeng, Shi, Weijie, Bu, Yang, Wang, Xiangzhao. Predictor of thermal aberrations via particle filter for online compensation. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2019, 第 2 作者 通讯作者 18(1): [35] Meng, Zejiang, Li, Sikun, Wang, Xiangzhao, Bu, Yang, Wang, Jian, Ni, Sheng, Yang, Chaoxing, Mao, Yanjie. Jones pupil metrology of lithographic projection lens and its optimal configuration in the presence of error sources. OPTICS EXPRESS[J]. 2019, 第 2 作者 通讯作者 27(4): 4629-4647, [36] 孟泽江, 李思坤, 王向朝, 步扬, 戴凤钊, 杨朝兴. 穆勒矩阵成像椭偏仪误差源的简化分析方法. 光学学报[J]. 2019, 第 2 作者148-159, [37] Zhu, Boer, Li, Sikun, Wang, Xiangzhao, Meng, Zejiang, Zhang, Heng, Dai, Fengzhao, Tang, Feng, Duan, Lifeng. High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix. OPTICS COMMUNICATIONS[J]. 2019, 第 2 作者 通讯作者 431: 158-166, [38] 孟泽江, 李思坤, 王向朝, 步扬, 杨朝兴. 光刻投影物镜的琼斯光瞳检测方法. 光学学报[J]. 2019, 第 2 作者199-209, [39] Zhang, Heng, Li, Sikun, Wang, Xiangzhao, Yang, Chaoxing, Cheng, Wei. Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy (vol 17, 043505, 2018). JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2019, 第 2 作者18(1): [40] Zhang, Heng, Li, Sikun, Wang, Xiangzhao, Meng, Zejiang, Cheng, Wei. Fast optimization of defect compensation and optical proximity correction for extreme ultraviolet lithography mask. OPTICS COMMUNICATIONS[J]. 2019, 第 2 作者 通讯作者 452: 169-180, [41] 孟泽江, 李思坤, 王向朝, 步扬, 杨朝兴, 戴凤钊. 基于差分空间像主成分分析的偏振像差检测方法. 光学学报[J]. 2019, 第 2 作者39(7): 150-158, [42] Zhu, Boer, Li, Sikun, Mao, Yanjie, Wang, Xiangzhao, Bu, Yang, Wang, Jian, Sun, Gang, Duan, Lifeng. Fast thermal aberration model for lithographic projection lenses. OPTICS EXPRESS[J]. 2019, 第 2 作者 通讯作者 27(23): 34039-34050, [43] Xiao, YongLiang, Li, Sikun, Zhang, Qican, Zhong, Jianxin, Su, Xianyu, You, Zhisheng. Optical fringe-reflection deflectometry with sparse representation. OPTICS AND LASERS IN ENGINEERING[J]. 2018, 第 2 作者104: 62-70, [44] Xiao, YongLiang, Li, Sikun, Zhang, Qican, Zhong, Jianxin, Su, Xianyu, You, Zhisheng. Optical fringe-reflection deflectometry with bundle adjustment. OPTICS AND LASERS IN ENGINEERING[J]. 2018, 第 2 作者105: 132-140, http://www.corc.org.cn/handle/1471x/1908225.[45] Mao, Yanjie, Li, Sikun, Sun, Gang, Duan, Lifeng, Bu, Yang, Wang, Xiangzhao. Modeling and optimization of lens heating effect for lithographic projector. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2018, 第 2 作者 通讯作者 17(2): [46] Kamagara, Abel, Wang, Xiangzhao, Li, Sikun. Nonlinear gamma correction via normed bicoherence minimization in optical fringe projection metrology. OPTICAL ENGINEERING[J]. 2018, 第 3 作者 通讯作者 57(3): [47] 张恒, 李思坤, 王向朝. 基于改进型结构分解的极紫外光刻掩模衍射谱快速仿真方法. 光学学报[J]. 2018, 第 2 作者38(1): 0105001-1, [48] Zhang Heng, Li Sikun, Wang Xiangzhao. A Rapid Simulation Method for Diffraction Spectra of EUV Lithography Mask Based on Improved Structural Decomposition. ACTA OPTICA SINICA[J]. 2018, 第 2 作者38(1): [49] Kamagara, Abel, Wang, Xiangzhao, Li, Sikun. Towards gamma-effect elimination in phase measurement profilometry. OPTIK[J]. 2018, 第 3 作者 通讯作者 172: 1089-1099, [50] 张恒, 李思坤, 王向朝, 成维. 基于机器学习校正的极紫外光刻含缺陷掩模仿真方法. 光学学报[J]. 2018, 第 2 作者38(12): 303-310, https://kns.cnki.net/KCMS/detail/detail.aspx?dbcode=CJFQ&dbname=CJFDLAST2019&filename=GXXB201812037&v=MjE3NDIxTHV4WVM3RGgxVDNxVHJXTTFGckNVUjdxZVorUnZGaXJsVUwzTElqWFRiTEc0SDluTnJZOUdZNFI4ZVg=.[51] Zhang, Heng, Li, Sikun, Wang, Xiangzhao, Yang, Chaoxing, Cheng, Wei. Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2018, 第 2 作者 通讯作者 17(4): [52] Kamagara, Abel, Wang, Xiangzhao, Li, Sikun. Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry. APPLIED OPTICS[J]. 2017, 第 3 作者56(28): 8014-8022, [53] 王磊, 李思坤, 王向朝, 杨朝兴. 基于粒子群优化算法的光刻机光源掩模投影物镜联合优化方法. 光学学报[J]. 2017, 第 2 作者37(10): 1022001-1, [54] 诸波尔, 王向朝, 李思坤, 孟泽江, 张恒, 戴凤钊, 段立峰. 超高NA光刻投影物镜高阶波像差检测方法. 光学学报[J]. 2017, 第 3 作者37(4): 170-179, https://d.wanfangdata.com.cn/periodical/gxxb201704021.[55] Kamagara, Abel, Wang, Xiangzhao, Li, Sikun. Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry. APPL. OPTICS[J]. 2017, 第 3 作者56(28): 8014, [56] Wang, Lei, Li, Sikun, Wang, Xiangzhao, Yan, Guanyong, Yang, Chaoxing. Pixelated source optimization for optical lithography via particle swarm optimization. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2016, 第 2 作者15(1): [57] Zhu, Boer, Wang, Xiangzhao, Li, Sikun, Yan, Guanyong, Shen, Lina, Duan, Lifeng. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image. APPL. OPTICS[J]. 2016, 第 3 作者55(12): 3192, [58] 杨朝兴, 李思坤, 王向朝. Source Mask Optimization Based on Dynamic Fitness Function. 光学学报[J]. 2016, 第 2 作者36(1): 111006, [59] 杨朝兴, 李思坤, 王向朝. Source Mask Optimization Based on Dynamic Fitness Function. 光学学报[J]. 2016, 第 2 作者36(1): 111006, [60] 杨朝兴, 李思坤, 王向朝. Pixelated Source Mask Optimization Based on Multi Chromosome Genetic Algorithm. 光学学报[J]. 2016, 第 2 作者36(8): 811001, http://ir.siom.ac.cn/handle/181231/28517.[61] Zhu, Boer, Shen, Lina, Wang, Xiangzhao, Li, Sikun, Yan, Guanyong, Zhang, Heng. General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination. JOPTSOCAMAOPTIMAGESCIVIS[J]. 2016, 第 4 作者33(6): 1112, [62] Li, Sikun, Wang, Xiangzhao, Tang, Feng, Bu, Yang, Sasaki, Osami. Nonsubsampled contourlet transform method for optical fringe pattern analysis in profilometry and interferometry. APPL. OPTICS[J]. 2016, 第 1 作者55(27): 7718, [63] Li, Sikun, Wang, Xiangzhao. Radial period extraction method employing frequency measurement for quantitative collimation testing. OPT. COMMUN.[J]. 2016, 第 1 作者358: 164, [64] 杨朝兴, 李思坤, 王向朝. Pixelated Source Mask Optimization Based on Multi Chromosome Genetic Algorithm. 光学学报[J]. 2016, 第 2 作者36(8): 811001, [65] 张恒, 李思坤, 王向朝. 基于分离变量法的极紫外光刻三维掩模快速仿真方法. 第十六届全国光学测试学术交流会摘要集. 2016, 第 2 作者[66] Li, Sikun, Wang, Xiangzhao, Tang, Feng, Bu, Yang, Sasaki, Osami. Nonsubsampled contourlet transform method for optical fringe pattern analysis in profilometry and interferometry. APPLIED OPTICS[J]. 2016, 第 1 作者55(27): 7718-7725, [67] Wang, Lei, Li, Sikun, Wang, Xiangzhao, Yan, Guanyong, Yang, Chaoxing. Pixelated source optimization for optical lithography via particle swarm optimization. J. MICRO-NANOLITHOGR. MEMS MOEMS[J]. 2016, 第 2 作者15(1): http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000374540300008&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=3a85505900f77cc629623c3f2907beab.[68] Shen, Lina, Wang, Xiangzhao, Li, Sikun, Yan, Guanyong, Zhu, Boer, Zhang, Heng. General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION[J]. 2016, 第 3 作者33(6): 1112-1119, [69] Zhu, Boer, Wang, Xiangzhao, Li, Sikun, Yan, Guanyong, Shen, Lina, Duan, Lifeng. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image. APPLIED OPTICS[J]. 2016, 第 3 作者55(12): 3192-3198, https://www.webofscience.com/wos/woscc/full-record/WOS:000374388600043.[70] Li, Sikun, Wang, Xiangzhao. Radial period extraction method employing frequency measurement for quantitative collimation testing. OPTICSCOMMUNICATIONS[J]. 2016, 第 1 作者358: 164-168, [71] 沈丽娜, 李思坤, 王向朝, 闫观勇. 投影物镜偏振像差对光刻成像质量影响的解析分析方法. 光学学报[J]. 2015, 第 2 作者35(6): 611003, [72] 刘晓雷, 王向朝, 李思坤. 极紫外光刻含缺陷掩模仿真模型及缺陷的补偿. 光学学报[J]. 2015, 第 3 作者35(8): 822006, [73] 王向朝, 刘晓雷, 李思坤. 基于等效膜层法的极紫外光刻含缺陷掩模多层膜仿真模型. 光学学报[J]. 2015, 第 3 作者35(6): 622005, [74] Liu, Xiaolei, Li, Sikun, Wang, Xiangzhao, Zhang, Heng. Optimal shift of pattern shifting for mitigation of mask defects in extreme ultraviolet lithography. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B[J]. 2015, 第 2 作者33(5): https://www.webofscience.com/wos/woscc/full-record/WOS:000361833200026.[75] 王磊, 李思坤, 王向朝, 闫观勇, 杨朝兴. 基于粒子群优化算法的光刻机光源优化方法. 光学学报[J]. 2015, 第 2 作者35(4): 422002, [76] Wang, Lei, Li, Sikun, Wang, Xiangzhao, Yan, Guanyong, Yang, Chaoxing. Source Optimization using Particle Swarm Optimization Algorithm in Photolithography. OPTICAL MICROLITHOGRAPHY XXVIII[J]. 2015, 第 2 作者[[[9426]]]: [[[]]], [77] Li, Sikun, Wang, Xiangzhao, Yang, Jishuo, Duan, Lifeng, Tang, Feng, Yan, Guanyong. In situ aberration measurement method using a phase-shift ring mask. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2015, 第 1 作者14(1): [78] Shen, Lina, Li, Sikun, Wang, Xiangzhao, Yan, Guanyong. Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality. OPTICAL MICROLITHOGRAPHY XXVIII. 2015, 第 2 作者http://ir.siom.ac.cn/handle/181231/17233.[79] Shen, Lina, Li, Sikun, Wang, Xiangzhao, Yan, Guanyong. Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2015, 第 2 作者14(4): [80] Li, Jie, Tang, Feng, Wang, Xiangzhao, Dai, Fengzhao, Feng, Peng, Li, Sikun. Wavefront reconstruction for lateral shearing interferometry based on difference polynomial fitting. JOURNAL OF OPTICS[J]. 2015, 第 6 作者17(6): [81] Liu, Xiaolei, Wang, Xiangzhao, Li, Sikun, Yan, Guanyong, Erdmann, Andreas. Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2014, 第 3 作者13(3): [82] Yan, Guanyong, Wang, Xiangzhao, Li, Sikun, Yang, Jishuo, Xu, Dongbo, Erdmann, Andreas. Aberration measurement technique based on an analytical linear model of a through-focus aerial image. OPTICS EXPRESS[J]. 2014, 第 3 作者22(5): 5623-5634, [83] Yan, Guanyong, Wang, Xiangzhao, Li, Sikun, Yang, Jishuo, Xu, Dongbo. Aberration measurement based on principal component analysis of aerial images of optimized marks. OPTICS COMMUNICATIONS[J]. 2014, 第 3 作者329: 63-68, [84] 李兆泽, 李思坤, 王向朝. 基于随机并行梯度速降算法的光刻机光源与掩模联合优化方法. 光学学报[J]. 2014, 第 2 作者34(9): 911002, [85] 刘晓雷, 李思坤, 王向朝. 极紫外光刻含缺陷多层膜衍射谱仿真简化模型. 光学学报[J]. 2014, 第 2 作者34(9): 905002, [86] Yang, Chaoxing, Li, Sikun, Wang, Xiangzhao. Efficient source mask optimization using multipole source representation. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2014, 第 2 作者13(4): https://www.webofscience.com/wos/woscc/full-record/WOS:000343072500008.[87] 闫观勇, 李思坤, 王向朝. 基于二次规划的光刻机光源优化方法. 光学学报[J]. 2014, 第 2 作者34(10): 257, [88] Yang, Jishuo, Wang, Xiangzhao, Li, Sikun, Duan, Lifeng, Bourov, Anatoly Y, Erdmann, Andreas. Adaptive denoising method to improve aberration measurement performance. OPTICS COMMUNICATIONS[J]. 2013, 第 3 作者308: 228-236, [89] Li, Sikun, Wang, Xiangzhao, Bu, Yang. Robust pixel-based source and mask optimization for inverse lithography. OPTICS AND LASER TECHNOLOGY[J]. 2013, 第 1 作者45: 285-293, [90] Yang, Jishuo, Wang, Xiangzhao, Li, Sikun, Duan, Lifeng, Yan, Guanyong, Xu, Dongbo, Bourov, Anatoly Y, Erdmann, Andreas. High-order aberration measurement technique based on a quadratic Zernike model with optimized source. OPTICAL ENGINEERING[J]. 2013, 第 3 作者52(5): [91] Xu Dongbo, Li Sikun, Wang Xiangzhao, Fuehner Tim, Erdmann Andreas, Bodermann B, Frenner K, Silver RM. Defect parameters retrieval based on optical projection images. MODELING ASPECTS IN OPTICAL METROLOGY IV[J]. 2013, 第 2 作者8789: [92] Li, Sikun, Xiao, YongLiang, Wang, Xiangzhao. Three-dimensional information security combined fringe projection with double random phase encoding. OPTICS COMMUNICATIONS[J]. 2013, 第 1 作者296: 35-40, http://dx.doi.org/10.1016/j.optcom.2012.12.046.[93] Tu, Yuanying, Wang, Xiangzhao, Li, Sikun, Cao, Yuting. Analytical approach to the impact of polarization aberration on lithographic imaging. OPTICS LETTERS[J]. 2012, 第 3 作者37(11): 2061-2063, [94] Sikun Li, Xianyu Su, Wenjing Chen. Hilbert assisted wavelet transform method of optical fringe pattern phase reconstruction for optical profilometry and interferometry. OPTIK - INTERNATIONAL JOURNAL FOR LIGHT AND ELECTRON OPTICS[J]. 2012, 第 1 作者123(1): 6-10, [95] Li, Sikun, Wang, Xiangzhao, Su, Xianyu, Tang, Feng. Two-dimensional wavelet transform for reliability-guided phase unwrapping in optical fringe pattern analysis. APPLIED OPTICS[J]. 2012, 第 1 作者51(12): 2026-2034, http://ir.siom.ac.cn/handle/181231/11352.[96] Li, Sikun, Su, Xianyu, Chen, Wenjing. A new wavelet transform for reliability-guided phase unwrapping of optical fringe patterns. OPTICS COMMUNICATIONS[J]. 2011, 第 1 作者284(20): 4879-4883,