发表论文
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Chinese Physics B[J]. 2022, 第 2 作者31(9): 098502, https://cpb.iphy.ac.cn/EN/10.1088/1674-1056/ac6159.[4] 成国栋, 陆江, 翟露青, 白云, 田晓丽, 左欣欣, 杨成樾, 汤益丹, 陈宏, 刘新宇. 槽栅型SiC MOSFET器件单粒子响应特性研究. 微电子学[J]. 2022, 第 2 作者52(3): 466-472, http://microelec.ijournals.cn/wdzx/article/abstract/20220322?st=article_issue.[5] Yang, Liao, Bai, Yun, Li, Chengzhan, Chen, Hong, Tang, Yidan, Hao, Jilong, Yang, Chengyue, Tian, Xiaoli, Lu, Jiang, Liu, Xinyu. Bias Temperature Instability of 4H-SiC p- and n-Channel MOSFETs Induced by Negative Stress at 200 degrees C. IEEE TRANSACTIONS ON ELECTRON DEVICES[J]. 2022, 第 9 作者69(6): 3042-3046, http://dx.doi.org/10.1109/TED.2022.3166126.[6] Wu, Zhikang, Bai, Yun, Yang, Chengyue, Lu, Jiang, Yang, Liao, Tang, Yidan, Tian, Xiaoli, Liu, Xinyu. Schottky Barrier Characteristic Analysis on 4H-SiC Schottky Barrier Diodes With Heavy Ion-Induced Degradation. IEEE TRANSACTIONS ON NUCLEAR SCIENCE[J]. 2022, 第 4 作者69(4): 932-937, http://dx.doi.org/10.1109/TNS.2022.3160181.[7] Han, Zhonglin, Bai, Yun, Chen, Hong, Li, Chengzhan, Lu, Jiang, Yang, Chengyue, Yao, Yao, Tian, Xiaoli, Tang, Yidan, Song, Guan, Liu, Xinyu. A Novel 4H-SiC Trench MOSFET Integrated With Mesa-Sidewall SBD. IEEE TRANSACTIONS ON ELECTRON DEVICES[J]. 2021, 第 5 作者68(1): 192-196, https://www.webofscience.com/wos/woscc/full-record/WOS:000602689000015.[8] Hao, JiLong, Bai, Yun, Liu, XinYu, Li, ChengZhan, Tang, YiDan, Chen, Hong, Tian, XiaoLi, Lu, Jiang, Wang, ShengKai. Improved electrical properties of NO-nitrided SiC/SiO(2)interface after electron irradiation*. CHINESE PHYSICS B[J]. 2020, 第 8 作者29(9): 470-475, http://lib.cqvip.com/Qikan/Article/Detail?id=7102932479.[9] Han, Zhonglin, Song, Guan, Bai, Yun, Chen, Hong, Liu, Xinyu, Lu, Jiang. A novel 4H-SiC MOSFET for low switching loss and high-reliability applications. SEMICONDUCTOR SCIENCE AND TECHNOLOGY[J]. 2020, 第 6 作者35(8): http://dx.doi.org/10.1088/1361-6641/ab8fbf.[10] Lu, Jiang, Liu, Jiawei, Tian, Xiaoli, Chen, Hong, Tang, Yidan, Bai, Yun, Li, Chengzhan, Liu, Xinyu. Impact of Varied Buffer Layer Designs on Single-Event Response of 1.2-kV SiC Power MOSFETs. IEEE TRANSACTIONS ON ELECTRON DEVICES[J]. 2020, 第 1 作者 通讯作者 67(9): 3698-3704, http://dx.doi.org/10.1109/TED.2020.3008398.[11] 冯旺, 田晓丽, 陆江, 白云. 碳化硅绝缘栅双极型晶体管器件发展概述. 电力电子技术[J]. 2020, 第 3 作者54(10): 1-4, http://lib.cqvip.com/Qikan/Article/Detail?id=7103115800.[12] Liu, Jiawei, Lu, Jiang, Tian, Xiaoli, Chen, Hong, Bai, Yun, Liu, Xinyu. Reliability enhanced SiC MOSFET with partially widened retrograde P-well structure. ELECTRONICS LETTERS[J]. 2020, 第 2 作者 通讯作者 56(23): 1273-+, https://www.webofscience.com/wos/woscc/full-record/WOS:000588389600020.[13] Hao, JiLong, Bai, Yun, Liu, XinYu, Li, ChengZhan, Tang, YiDan, Chen, Hong, Tian, XiaoLi, Lu, Jiang, Wang, ShengKai. Improved electrical properties of NO-nitrided SiC/SiO 2 interface after electron irradiation. CHINESE PHYSICS B[J]. 2020, 第 8 作者29(9): http://dx.doi.org/10.1088/1674-1056/ab9434.[14] Han, Zhonglin, Bai, Yun, Chen, Hong, Li, Chengzhan, Lu, Jiang, Song, Guan, Liu, Xinyu. A trench/planar SiC MOSFET integrated with SBD (TPSBD) for low reverse recovery charge and low switching loss. SEMICONDUCTOR SCIENCE AND TECHNOLOGY[J]. 2020, 第 5 作者35(10): https://www.webofscience.com/wos/woscc/full-record/WOS:000566476300001.[15] Lu, Jiang, Liu, Jiawei, Tian, Xiaoli, Chen, Hong, Bai, Yun, Liang, Fei, Liu, Xinyu. 1200 V buried gate fin p-body IGBT with ultralow on-state voltage and good short circuit capability. ELECTRONICS LETTERS[J]. 2020, 第 1 作者 通讯作者 56(20): 1082-+, https://www.webofscience.com/wos/woscc/full-record/WOS:000581633600022.[16] Lu Jiang, Tian Xiaoli, Liu Jiawei, Chen Hong, Liang Fei, Bai Yun, IEEE. A very narrow mesa biased IGBT for ultra-low on-state saturation voltage and a good short circuit ruggedness. 2019 IEEE INTERNATIONAL CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC). 2019, 第 1 作者http://apps.webofknowledge.com/CitedFullRecord.do?product=UA&colName=WOS&SID=5CCFccWmJJRAuMzNPjj&search_mode=CitedFullRecord&isickref=WOS:000483036000021.[17] Lu Jiang, Liu Jiawei, Tian Xiaoli, Chen Hong, Liang Fei, Bai Yun, IEEE. High Performance SEB Hardened Trench Power MOSFFT with Partially Widened Split Gate and Trench Source. 2019 IEEE INTERNATIONAL CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC). 2019, 第 1 作者http://apps.webofknowledge.com/CitedFullRecord.do?product=UA&colName=WOS&SID=5CCFccWmJJRAuMzNPjj&search_mode=CitedFullRecord&isickref=WOS:000483036000281.[18] Sun, Yue, Kang, Xuanwu, Zheng, Yingkui, Lu, Jiang, Tian, Xiaoli, Wei, Ke, Wu, Hao, Wang, Wenbo, Liu, Xinyu, Zhang, Guoqi. Review of the Recent Progress on GaN-Based Vertical Power Schottky Barrier Diodes (SBDs). ELECTRONICS. 2019, 第 4 作者8(5): https://doaj.org/article/a2552996f16e4d98913c6cc9bf22432c.[19] Lu, Jiang, Liu, Jiawei, Tian, Xiaoli, Chen, Hong, Liang, Fei, Bai, Yun, IEEE. Improvement of Clamped Inductive Turn-Off Ruggedness of Trench IGBT at Overcurrent Condition with Optimized Split Gate Structure. 2019 16TH CHINA INTERNATIONAL FORUM ON SOLID STATE LIGHTING & 2019 INTERNATIONAL FORUM ON WIDE BANDGAP SEMICONDUCTORS CHINA (SSLCHINA: IFWS). 2019, 第 1 作者42-45, http://apps.webofknowledge.com/CitedFullRecord.do?product=UA&colName=WOS&SID=5CCFccWmJJRAuMzNPjj&search_mode=CitedFullRecord&isickref=WOS:000559774100012.[20] Jiang Lu, Hainan Liu, Xiaowu Cai, Jiajun Luo, Bo Li, Binhong Li, Lixin Wang, Zhengsheng Han. Single-event burnout hardening of planar power MOSFET with partially widened trench source. 半导体学报英文版[J]. 2018, 第 1 作者39(3): 44-49, http://lib.cqvip.com/Qikan/Article/Detail?id=674826724.[21] Lu Jiang, Liu Hainan, Cai Xiaowu, Luo Jiajun, Li Bo, Li Binhong, Wang Lixin, Han Zhengsheng. Single-event burnout hardening of planar power MOSFET with partially widened trench source. JOURNAL OF SEMICONDUCTORS[J]. 2018, 第 1 作者 通讯作者 39(3): 034003-1, http://lib.cqvip.com/Qikan/Article/Detail?id=674826724.[22] Tian XiaoLi, Lu Jiang, Bai Yun, Chen Hong, Liu XinYu, Jiang YL, Tang TA, Ye F. An Improved Edge Termination Structure to Optimize 3.3kV IGBTs Ruggedness. 2018 14TH IEEE INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY (ICSICT). 2018, 第 2 作者356-358, http://apps.webofknowledge.com/CitedFullRecord.do?product=UA&colName=WOS&SID=5CCFccWmJJRAuMzNPjj&search_mode=CitedFullRecord&isickref=WOS:000458919700109.[23] QiaoQunYu, JiangLu, HaiNanLiu, JiaJunLuo, BoLi, LiXinWang, ZhengShengHan. Superjunction nanoscale partially narrow mesa IGBT towards superior performance. Chinese Physics B[J]. 2017, 第 2 作者 通讯作者 26(3): 38502-038502, https://cpb.iphy.ac.cn/EN/10.1088/1674-1056/26/3/038502.[24] Lu Jiang, Luo Jiajun, Liu Hainan, Han Zhengsheng, Wang Lixin, Yu Qiaoqun, Li Bo. Superjunction nanoscale partially narrow mesa IGBT towards superior performance. CHIN. PHYS. B[J]. 2017, 第 1 作者http://159.226.55.106/handle/172511/18030.[25] 杨尊松, 王立新, 肖超, 宋李梅, 罗小梦, 李彬鸿, 陆江, 孙博韬. 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