基本信息
赵俊  男  硕导  中国科学院上海应用物理研究所
电子邮件: zhaojun@zjlab.org.cn
通信地址: 上海市浦东新区张衡路239号
邮政编码:

招生信息

   
招生专业
082703-核技术及应用
招生方向
软X射线干涉光刻方法

教育背景

2002-09--2005-06   武汉理工大学   硕士研究生
1997-09--2001-06   武汉理工大学   本科

工作经历

   
工作简历
2018-10~现在, 中国科学院上海高等研究院, 副研究员
2013-05~2018-09,中国科学院上海应用物理研究所, 助理研究员
2013-01~2013-04,华力微电子有限公司, 主任工程师
2009-09~2012-12,中国科学院上海应用物理研究所, 助理研究员
2005-07~2009-08,中芯国际集成电路制造(上海)有限公司, 主任工程师
2002-09~2005-06,武汉理工大学, 硕士研究生
1997-09~2001-06,武汉理工大学, 本科

专利与奖励

   
专利成果
( 1 ) 一种荧光靶探测器, 2020, 第 3 作者, 专利号: CN212031751U

( 2 ) 一种精确缩短节距值的自溯源光栅标准物质制备方法, 2020, 第 6 作者, 专利号: CN111650680A

( 3 ) 一种荧光靶探测器及其探测方法, 2020, 第 3 作者, 专利号: CN111208553A

出版信息

   
发表论文
(1) Hybrid application of laser-focused atomic deposition and extreme ultraviolet interference lithography methods for manufacturing of self-traceable nanogratings, NANOTECHNOLOGY, 2021, 
(2) Analysis of partially coherent light propagation through the soft X-ray interference lithography beamline at SSRF, JOURNAL OF SYNCHROTRON RADIATION, 2021, 
(3) 上海光源极紫外光刻胶检测平台, Extreme Ultraviolet Photoresist Inspection Platform in Shanghai Synchrotron Radiation Facility, 应用化学, 2021, 第 1 作者
(4) Directional light outcoupling enhancement of scintillators via hollow microlens arrays, JOURNAL OF LUMINESCENCE, 2021, 
(5) 极紫外光刻胶产气的定性和定量检测, Qualitative and Quantitative Measurement of Outgassing of Molecular Glass Photoresists under ExtremeUltraviolet Lithography, 分析化学, 2020, 第 5 作者
(6) The recent development of soft x-ray interference lithography in SSRF, The recent development of soft x-ray interference lithography in SSRF, 极端制造(英文), 2020, 
(7) Influence of dry etching on the properties of SiO2 and HfO2 single layers, APPLIED OPTICS, 2020, 
(8) Molecular Glass Resists Based on 9,9 '-Spirobifluorene Derivatives: Pendant Effect and Comprehensive Evaluation in Extreme Ultraviolet Lithography, ACS APPLIED POLYMER MATERIALS, 2019, 
(9) Nonuniform self-imaging of achromatic Talbot lithography, CHINESE OPTICS LETTERS, 2019, 
(10) Broadband Optical Absorber Based on Nanopatterned Metallic Glass Thin Films, JOURNAL OF PHYSICAL CHEMISTRY LETTERS, 2019, 
(11) Parallel direct writing achromatic talbot lithography: a method for large-area arbitrary sub-micron periodic nano-arrays fabrication, NANOTECHNOLOGY, 2019, 
(12) Significant Enhancement in Light Output of Photonic-Crystal-Based YAG:Ce Scintillator for Soft X-Ray Detectors, IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2019, 
(13) 上海光源在材料科学上的应用, 现代物理知识, 2019, 第 7 作者
(14) Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography, APPLIED SURFACE SCIENCE, 2017, 
(15) Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography, MICROELECTRONIC ENGINEERING, 2017, 
(16) Development of broadband X-ray interference lithography large area exposure system, REVIEW OF SCIENTIFIC INSTRUMENTS, 2016, 
(17) High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography, OPTICS EXPRESS, 2016, 
(18) Geometrical and morphological optimizations of plasmonic nanoarrays for high-performance SERS detection., NANOSCALE, 2015, 
(19) Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography, APPLIED PHYSICS LETTERS, 2015, 
(20) 光子晶体制备方法对同步辐射闪烁体探测器成像分辨率的影响, 核技术, 2015, 第 3 作者
(21) Angle-insensitive plasmonic color filters with randomly distributed silver nanodisks, OPTICS LETTERS, 2015, 
(22) Duty cycle dependency of the optical transmission spectrum in an ultrathin nanostructured Ag film, JOURNAL OF ALLOYS AND COMPOUNDS, 2015, 
(23) Preparation and characterization of p-type transparent conducting SnO thin films, MATERIALS LETTERS, 2015, 
(24) Developments at SSRF in soft X-ray interference lithography, NUCLEAR SCIENCE AND TECHNIQUES, 2015, 
(25) Influence of structural parameters to polarization-independent color-filter behavior in ultrathin Ag films, OPTICS COMMUNICATIONS, 2014, 
(26) Large-scale uniform Au nanodisk arrays fabricated via x-ray interference lithography for reproducible and sensitive SERS substrate, NANOTECHNOLOGY, 2014, 

科研活动

   
科研项目
( 1 ) EUV在波长掩模检测技术研究, 负责人, 国家任务, 2022-01--2026-12