基本信息

魏星 男 博导 中国科学院上海微系统与信息技术研究所
电子邮件: xwei@mail.sim.ac.cn
通信地址: 上海市长宁区长宁路865号8号楼604房间
邮政编码: 200050
电子邮件: xwei@mail.sim.ac.cn
通信地址: 上海市长宁区长宁路865号8号楼604房间
邮政编码: 200050
招生信息
招生专业
080903-微电子学与固体电子学
招生方向
300mm SOI材料及新型SOI器件300mm直拉硅单晶晶体生长/缺陷动力学/缺陷工程跨尺度/多场耦合下晶体生长过程的数值模拟
教育背景
2007-04--2010-03 中国科学院上海微系统与信息技术研究所 博士2004-09--2007-03 长春理工大学 硕士2000-09--2004-07 长春理工大学 学士
工作经历
工作简历
2019-01~现在, 中国科学院上海微系统与信息技术研究所, 研究员2013-01~2018-12,中国科学院上海微系统与信息技术研究所, 副研究员2010-06~2012-12,中国科学院上海微系统与信息技术研究所, 助理研究员2007-04~2010-03,中国科学院上海微系统与信息技术研究所, 博士2004-09~2007-03,长春理工大学, 硕士2000-09~2004-07,长春理工大学, 学士
专利与奖励
奖励信息
(1) 上海市五一劳动奖章, 省级, 2019
专利成果
( 1 ) METHOD FOR CLEANING BONDING INTERFACE BEFORE BONDING, 2020, 第 1 作者, 专利号: US15/905, 339( 2 ) ANNEALING METHOD FOR IMPROVING BONDING STRENGTH, 2020, 第 1 作者, 专利号: US15/906, 074( 3 ) METHOD FOR PREPARING SUBSTRATE WITH INSULATED BURIED LAYER, 2019, 第 1 作者, 专利号: US15/905, 344( 4 ) METHOD FOR PREPARING SUBSTRATE WITH CARRIER TRAPPING CENTER, 2019, 第 1 作者, 专利号: US15/905, 492
出版信息
发表论文
(1) Investigation on boron diffusion effects in buried oxide of Si nanocrystals (Si NCs) embedded Silicon-on-Insulator, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2023, 第 11 作者(2) Determination of conduction type in high-resistivity silicon by combining spreading resistance profiling (SRP) with hydrofluoric acid treatment, APPLIED PHYSICS LETTERS, 2023, 第 11 作者(3) Effects of Induced Current in Crystals on the Melt Flow and the Melt-Crystal Interface during Industrial 300 mm Czochralski Silicon Crystal Growth under a Transverse Magnetic Field, CRYSTAL GROWTH & DESIGN, 2023, (4) Three-dimensional modelling of 300 mm Czochralski silicon crystal growth with a transverse magnetic field, CRYSTENGCOMM, 2023, (5) Investigation of Negative Bias Effect on Radiation Hardening for Double SOI Technology, IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2022, 第 11 作者(6) Analysis of Abnormal GIDL Current Degradation Under Hot Carrier Stress in DSOI-MOSFETs, IEEE TRANSACTIONS ON ELECTRON DEVICES, 2022, 第 11 作者(7) Investigation of microscale and nanoscale twin lamellae in monocrystalline silicon grown by Czochralski method, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2022, 第 11 作者(8) Investigation on time-dependent behavior of resistivity in high-resistivity silicon wafers, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2022, 第 11 作者(9) Novel Void Embedded Design for Total Ionizing Dose Hardening of Silicon-on Insulator MOSFET, IEEE ELECTRON DEVICE LETTERS, 2022, 第 11 作者(10) Melt convection and temperature distribution in 300mm Czochralski crystal growth with transverse magnetic field, JOURNAL OF CRYSTAL GROWTH, 2022, 第 11 作者(11) Investigation on the Transformation of B-Defect in As-Grown Czochralski Silicon Crystal during Annealing Process, ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2022, 第 11 作者(12) Gate-All-Around MOSFET Built on Void Embedded Silicon on Insulator Substrate, IEEE ELECTRON DEVICE LETTERS, 2021, 第 11 作者(13) Investigation on surface smoothing of silicon-on-insulator with gas phase hydrogen chloride etching, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2021, 第 11 作者(14) Characterization of grown-in defects in Si wafers by gas decoration, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2021, 第 11 作者(15) Fabrication of silicon-on-insulator with high uniform top Si for silicon photonics applications, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2020, 第 11 作者(16) Effects of boron doping on non-linear properties of SOI with embedded polycrystalline silicon layer for RF applications, SOLID-STATE ELECTRONICS, 2020, 第 11 作者(17) Comparative Investigation on Bias Dependent RF Performance of SOI Substrates, ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2019, 第 11 作者(18) Investigation on Evolution of Oxygen Precipitates in Bonded SOI Substrate, ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2019, 第 11 作者(19) Silicon on Insulator with Highly Uniform Top Si Fabricated by H/He Coimplantation, CHINESE PHYSICS LETTERS, 2019, 第 11 作者(20) Effects of Low Boron Concentration on Electrical Properties of Commercial Trap-Rich High Resistivity SOI Substrate, ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2018, 第 11 作者(21) Fabrication and Characterization of Radiation Hardened SOI Wafers via Ion-Cut Technique, ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2018, 第 11 作者(22) Resistivity and Radio-Frequency Properties of Two-Generation Trap-Rich Silicon-on-Insulator Substrates, Resistivity and Radio-Frequency Properties of Two-Generation Trap-Rich Silicon-on-Insulator Substrates, 中国物理快报英文版, 2018, 第 11 作者(23) Enhanced cracking in Si/B-doped Si0.70Ge0.30/Si heterostructures via hydrogen trapping effect, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2018, 第 11 作者(24) Investigation of radiation hardened SOI wafer fabricated by ion-cut technique, NUCLEAR INST. AND METHODS IN PHYSICS RESEARCH, B, 2018, 第 11 作者
科研活动
科研项目
( 1 ) 特种SOI晶圆及新型器件研究, 负责人, 国家任务, 2022-11--2026-10( 2 ) 300mm特殊硅单晶晶体生长, 负责人, 国家任务, 2022-01--2024-12( 3 ) 国家高层次人才特殊支持计划, 负责人, 国家任务, 2022-01--2024-12( 4 ) 全耗尽绝缘体上硅(FD-SOI)材料及其制备工艺中的基础问题研究, 负责人, 国家任务, 2021-01--2024-12