计算光刻、计算测量、对准和套刻技术、深紫外极紫外和新型光刻技术、计算表征和深度学习方法

   

140100-集成电路科学与工程
080903-微电子学与固体电子学

计算光刻，计算测量
计算光刻

2009-09--2014-07   中国科学院半导体研究所   硕博连读/博士学位

   

2018-04~现在, 中国科学院微电子研究所, 副研究员
2014-07~2018-03,中国科学院微电子研究所, 助理研究员

   

（1） 2023年度中国光学学会科技创新奖, 一等奖, 部委级, 2023
（2） 2023年北京市科技进步二等奖, 二等奖, 省级, 2023
（3） 科研新星, 一等奖, 研究所（学校）, 2017

[1] 高澎铮, 韦亚一, 张利斌. 一种基于光源添加辅助图形的方法和装置. CN: CN114089595A, 2022-02-25.
[2] 何建芳, 韦亚一, 粟雅娟, 董立松, 张利斌, 陈睿, 马乐. 一种掩模参数优化方法及装置. CN: CN114137792A, 2022-03-04.
[3] 张利斌, 韦亚一, 宋桢. 一种半导体器件的制造方法. CN: CN113990742A, 2022-01-28.
[4] 张双, 韦亚一, 张利斌, 盖天洋, 何建芳. 用于优化光刻工艺窗口的方法及装置、计算机存储介质. CN: CN112817212A, 2021-05-18.
[5] 杨尚, 韦亚一, 张利斌. 一种环形图案的光学邻近效应校正方法. CN: CN112859536A, 2021-05-28.
[6] 杨尚, 韦亚一, 张利斌. 一种环形图案的光学邻近效应校正方法. CN: CN112859536B, 2023-08-11.
[7] 何建芳, 韦亚一, 张利斌, 高澎铮, 张双. 光刻仿真中斜线图形的光源掩模优化方法、工艺窗口形成方法以及光刻方法. CN: CN112327575A, 2021-02-05.
[8] 马乐, 韦亚一, 张利斌. 一种版图获取方法及装置. CN: CN112257701A, 2021-01-22.
[9] 张利斌, 韦亚一, 冯耀斌, 陆聪. 一种套刻标识图像处理方法及装置. CN: CN112258468A, 2021-01-22.
[10] 高澎铮, 韦亚一, 张利斌. 亚分辨率辅助图形添加方法及装置、计算机可读存储介质. CN: CN112099319A, 2020-12-18.
[11] 张利斌, 韦亚一, 冯耀斌, 陆聪. 套刻偏差值的修正方法、电子设备及计算机可读存储介质. CN: CN112015056B, 2023-01-03.
[12] 张利斌, 韦亚一, 冯耀斌, 陆聪. 套刻偏差值的修正方法、电子设备及计算机可读存储介质. CN: CN112015056A, 2020-12-01.
[13] 张利斌, 韦亚一, 冯耀斌. 自对准金属层的制造方法、半导体器件及电子设备. CN: CN112017970A, 2020-12-01.
[14] 张利斌, 韦亚一, 马乐, 高澎铮, 刘伟晨, 张双. 一种光刻机工艺稳定性检测方法及装置. CN: CN111430261B, 2023-01-24.
[15] 张利斌, 韦亚一, 马乐, 高澎铮, 刘伟晨, 张双. 一种工艺检测方法及装置. CN: CN111430261A, 2020-07-17.
[16] 马乐, 韦亚一, 张利斌, 陈睿. 一种修正模型的建立方法及装置、掩模优化方法及装置. CN: CN111443569A, 2020-07-24.
[17] 刘伟晨, 韦亚一, 张利斌. 一种层图案化方法和半导体器件、集成电路和电子设备. CN: CN111341658A, 2020-06-26.
[18] 马恩泽, 韦亚一, 张利斌, 董立松. 一种获取套刻误差量测数据的方法及装置. CN: CN111123662A, 2020-05-08.
[19] 何建芳, 韦亚一, 董立松, 张利斌, 陈睿, 张双. 提高版图光刻性能的方法、修正后的版图及仿真方法. CN: CN110989289A, 2020-04-10.
[20] 何建芳, 韦亚一, 粟雅娟, 董立松, 张利斌, 苏晓菁, 陈睿, 马玲. 一种确定光刻工艺节点禁止周期的方法及仿真方法. CN: CN111025856B, 2021-08-13.
[21] 马乐, 韦亚一, 张利斌, 陈睿. 一种光学临近效应的修正方法、修正装置及掩模. CN: CN110716386A, 2020-01-21.
[22] 陈睿, 韦亚一, 唐明浩, 张利斌, 马乐, 粟雅娟, 董立松, 何建芳, 王文武. 一种基板及其制备方法. CN: CN110752180B, 2022-03-08.
[23] 张利斌, 韦亚一, 陈睿, 马乐. 一种三维器件的套刻误差补偿方法及系统. CN: CN110620057A, 2019-12-27.
[24] 张利斌, 韦亚一, 马乐, 高澎铮. 一种三维重建方法及装置. CN: CN110415335A, 2019-11-05.
[25] 高澎铮, 韦亚一, 张利斌. 一种根据规则添加SRAF的方法. CN: CN110187600A, 2019-08-30.
[26] 苏晓菁, 韦亚一, 张利斌. 辅助图形的添加方法、添加装置、存储介质和处理器. CN: CN110221516A, 2019-09-10.
[27] 张利斌, 韦亚一. 孔型结构工艺质量的检测方法、检测装置、存储介质和处理器. CN: CN110189300A, 2019-08-30.
[28] 高澎铮, 韦亚一, 张利斌. 一种光源掩模协同优化初始光源的确定方法及装置. CN: CN109683447A, 2019-04-26.
[29] 刘伟晨, 韦亚一, 张利斌",null,null,null,"王文武. 半导体结构与其制作方法. CN: CN109904060A, 2019-06-18.
[30] 马乐, 韦亚一, 张利斌. 一种确定光刻光源模型的训练方法及装置. CN: CN111999992A, 2020-11-27.
[31] 马乐, 韦亚一, 张利斌. 一种确定光刻光源模型的训练方法及装置. CN: CN111999992B, 2023-05-02.
[32] 马乐, 韦亚一, 张利斌. 确定光刻光源的方法、装置及模型训练方法、装置. CN: CN109143796A, 2019-01-04.
[33] 张利斌, 韦亚一. 一种定位工艺缺陷的方法及装置. CN: CN108335990A, 2018-07-27.
[34] 赵利俊, 韦亚一, 董立松, 张利斌. 测试图形的选取方法和装置、构建光刻模型的方法和装置. CN: CN108153995A, 2018-06-12.
[35] 张利斌, 韦亚一. 一种电子显微图像线条宽度和粗糙度的测量方法. CN: CN107144210A, 2017-09-08.
[36] 张利斌, 韦亚一. 一种光刻工艺窗口的测量方法. CN: CN106325005A, 2017-01-11.
[37] 张利斌, 韦亚一. 一种线条粗糙度的测量方法及系统. CN: CN106352820A, 2017-01-25.
[38] 张利斌, 董立松, 苏晓菁, 韦亚一. 五级衍射光栅结构及其制备方法、晶圆光刻对准方法. CN: CN105607435A, 2016-05-25.
[39] 张利斌, 董立松, 苏晓菁, 韦亚一. 七级衍射光栅结构及其制备方法、晶圆光刻对准方法. CN: CN105549138A, 2016-05-04.
[40] 张利斌, 粟雅娟, 韦亚一. 一种扫描电子显微图像的三维重构方法. CN: CN105590338A, 2016-05-18.
[41] 张利斌, 韦亚一. 一种半导体器件的制造方法. CN: CN106252229B, 2019-04-23.
[42] 张利斌, 韦亚一. 一种半导体器件的制造方法. CN: CN106252229A, 2016-12-21.
[43] 张利斌, 韦亚一. 一种自对准双重图形成像方法. CN: CN106200272A, 2016-12-07.
[44] 马乐, 韦亚一, 张利斌. 一种表面等离子体光刻成像结构. CN: CN117492330A, 2024-02-02.
[45] 沈浩, 韦亚一, 张利斌. 一种光刻机工件台振动性能与成像质量的分析方法. CN: CN117148686A, 2023-12-01.
[46] 刘爽, 张利斌, 韦亚一. 含噪声电子束图像的轮廓提取方法、装置、系统和介质. CN: CN117095020A, 2023-11-21.
[47] 张双, 韦亚一, 张利斌, 盖天洋, 何建芳. 用于优化光刻工艺窗口的方法及装置、计算机存储介质. CN: CN112817212B, 2024-02-20.
[48] 何建芳, 韦亚一, 张利斌, 高澎铮, 张双. 光刻仿真中斜线图形的光源掩模优化方法、工艺窗口形成方法以及光刻方法. CN: CN112327575B, 2024-04-12.
[49] 张利斌, 韦亚一, 冯耀斌, 陆聪. 一种套刻标识图像处理方法及装置. CN: CN112258468B, 2025-01-07.
[50] 高澎铮, 韦亚一, 张利斌. 亚分辨率辅助图形添加方法及装置、计算机可读存储介质. CN: CN112099319B, 2023-10-03.
[51] 张利斌, 韦亚一, 马乐, 高澎铮. 一种三维重建方法及装置. CN: CN111583397B, 2024-06-04.
[52] 何建芳, 韦亚一, 董立松, 张利斌, 陈睿, 张双. 提高版图光刻性能的方法、修正后的版图及仿真方法. CN: CN110989289B, 2024-01-23.
[53] 马乐, 韦亚一, 张利斌, 陈睿. 一种光学临近效应的修正方法、修正装置及掩模. CN: CN110716386B, 2023-10-20.

   

[1] Dinghai Rui, Libin Zhang, Huwen Ding, Hao Shen, Wei, Yayi, Yajuan Su. Super-resolution imaging using surface plasmon resonance cavity lithography. Optics Express[J]. 2025, 第 2 作者  通讯作者  33(8): 17976-17989, https://doi.org/10.1364/OE.559423.
[2] 杨欣华, 江一鹏, 李思坤, 廖陆峰, 张双, 张利斌, 张生睿, 施伟杰, 韦亚一, 王向朝. 基于广度优先搜索的全芯片光源掩模优化关键图形筛选方法. 光学学报[J]. 2024, 第 6 作者44(9): 131-141, http://lib.cqvip.com/Qikan/Article/Detail?id=7112564841.
[3] Rui, Dinghai, Zhang, Libin, Shen, Hao, Ding, Huwen, Liu, Shuang, Wei, Yayi, Su, Yajuan. Lithography mask thermal and stress effect for the machine overlay compensation. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B[J]. 2024, 第 2 作者  通讯作者  42(4): http://dx.doi.org/10.1116/6.0003693.
[4] Hao Shen, Libin Zhang, Dinghai Rui, Ge Liu, Yajuan Su, Wei, Yayi, Ming Fang. Source and mask optimization for stability of reticle and wafer stages. Optics Express[J]. 2024, 第 2 作者  通讯作者  32(19): 33603-33617, 
[5] Rui, Dinghai, Zhang, Libin, Ding, Huwen, Shen, Hao, Wei, Yayi, Su, Yajuan. Influencing factors of self-aligned imaging in near-field lithography for the Fabry-Perot cavity effect. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS[J]. 2024, 第 2 作者  通讯作者  41(12): 2702-2713, http://dx.doi.org/10.1364/JOSAB.538952.
[6] Liu, Shuang, Liu, Ge, Shen, Hao, Rui, Dinghai, Zhang, Libin, Wei, Yayi. Method to reconstruct three-dimensional profile based on top-view SEM images. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B[J]. 2024, 第 5 作者  通讯作者  42(3): http://dx.doi.org/10.1116/6.0003471.
[7] Ding, Huwen, Fan, Taian, Zhang, Libin, Wei, Yayi, Ye, Tianchun. Three-dimensional plasmonic lithography imaging modeling based on the RCWA algorithm for computational lithography. OPTICS EXPRESS[J]. 2023, 第 3 作者31(22): 36061-36077, http://dx.doi.org/10.1364/OE.500590.
[8] Shen, Hao, Zhang, Libin, Wei, Yayi, Liu, Shuang. Influence of the vibration of extreme ultraviolet lithographic tool stages on imaging. OPTICS EXPRESS[J]. 2023, 第 2 作者31(14): 22358-22371, http://dx.doi.org/10.1364/OE.493210.
[9] Zhang, Shuang, Zhang, Libin, Ding, Chenghong, Wang, Lei, Zhang, Hongru, Ding, Ming, Zhang, Shengrui, Shi, Weijie, Wei, Yayi. DTCO optimizes critical path nets to improve chip performance with timing-aware OPC in deep ultraviolet lithography. APPLIED OPTICS[J]. 2023, 第 2 作者62(27): 7216-7225, http://dx.doi.org/10.1364/AO.499615.
[10] Song, Z H E N, Zhang, L I B I N, Yang, S H A N G, Su, Y A J U A N, Wei, YAIn, Ye, T I A N C H U N. Balance between the diffraction efficiency and process robustness for plasmonic lithographic alignment technology considering the Fabry-Perot resonator effect. APPLIED OPTICS[J]. 2023, 第 2 作者  通讯作者  62(15): 3839-3847, http://dx.doi.org/10.1364/AO.487682.
[11] Li, Liang, Chen, Chao, Zeng, Hui, Hu, Shiyi, Zhang, Libin, Su, Yajuan, Wei, Yayi, Ye, Tianchun, Wang, Yun, Xue, Jing. Analysis of diffraction-based wafer alignment rejection for thick aluminum process. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B[J]. 2022, 第 5 作者  通讯作者  40(2): http://dx.doi.org/10.1116/6.0001666.
[12] Ma, Enze, Zhang, Libin, Feng, Yaobin, Ma, Le, Zhang, Shixin, Wei, Yayi. Overlay control solution for high aspect ratio etch process induced overlay error. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B[J]. 2022, 第 2 作者  通讯作者  40(4): http://dx.doi.org/10.1116/6.0001814.
[13] Song, Zhen, Zhang, Libin, He, Jianfang, Liu, Lihong, Ma, Le, Su, Yajuan, Wei, Yayi. A self-aligned lithography method based on Fabry-Perot resonator effect. OPTIK[J]. 2022, 第 2 作者  通讯作者  261: http://dx.doi.org/10.1016/j.ijleo.2022.169199.
[14] Zhang, Shuang, Zhang, Libin, Gai, Tianyang, Xu, Peng, Wei, Yayi. Aberration analysis and compensate method of a BP neural network and sparrow search algorithm in deep ultraviolet lithography. APPLIED OPTICS[J]. 2022, 第 2 作者61(20): 6023-6032, http://dx.doi.org/10.1364/AO.462436.
[15] Zhang, Libin, Feng, Yaobin, Song, Zhen, Yang, Shang, Wei, Yayi. Zernike model for overlay control and tool monitor for lithography and etch process. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B[J]. 2022, 第 1 作者  通讯作者  40(6): http://dx.doi.org/10.1116/6.0002239.
[16] Gai, Tianyang, Qu, Tong, Su, Xiaojing, Wang, Shuhan, Dong, Lisong, Zhang, Libin, Chen, Rui, Su, Yajuan, Wei, Yayi, Ye, Tianchun, Yuan, CM, Kim, RH. Multi-Level Layout Hotspot Detection based on Multi-Classification With Deep Learning. DESIGN-PROCESS-TECHNOLOGY CO-OPTIMIZATION XV. 2021, 第 6 作者11614: 
[17] Liu, Weichen, Zhang, Libin, Chen, Rui, Wu, Xin, Yang, Shang, Wei, Yayi. The Phase Aggregation Behavior of the Blend Materials Block Copolymer Polystyrene-b-Polycarbonate (PS-b-PC) and Homopolymer Polystyrene (PS). MACROMOLECULAR CHEMISTRY AND PHYSICS[J]. 2021, 第 2 作者  通讯作者  222(8): http://dx.doi.org/10.1002/macp.202000432.
[18] Zhang, Shuang, Zhang, Libin, Gai, Tianyang, Gao, Pengzheng, Wei, Yayi. Aberration analysis and compensate method of fully connected neural network in deep ultraviolet lithography. OPTICAL ENGINEERING[J]. 2021, 第 2 作者60(12): http://dx.doi.org/10.1117/1.OE.60.12.123105.
[19] Su, Xiaojing, Shen, Dong, Wei, Yayi, Su, Yajuan, Dong, Lisong, Chen, Rui, Gai, Tianyang, Zhang, Libin. Projection-based high coverage fast layout decomposing algorithm of metal layer for accelerating lithography friendly design at full chip level. JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3[J]. 2021, 第 8 作者20(1): http://dx.doi.org/10.1117/1.JMM.20.1.013401.
[20] Su, Xiaojing, Zhang, Libin, Wei, Yayi, Chen, Rui, Su, Yajuan, Dong, Lisong, Du, Chunshan, Wan, Qijian, Hu, Xinyi, Yuan, CM, Kim, RH. Via Optimization Methodology for Enhancing Robustness of Design at 14/12nm Technology Node. DESIGN-PROCESS-TECHNOLOGY CO-OPTIMIZATION FOR MANUFACTURABILITY XIV[J]. 2021, 第 2 作者11328: 
[21] Gao, Pengzheng, Zhang, Libin, Wei, YaYi, Owa, S, Phillips, MC. SRAF generation based on SGM/CTM contour line. OPTICAL MICROLITHOGRAPHY XXXIV. 2021, 第 2 作者11613: 
[22] YingFei Wang, QingChun Zhang, Ping Li, XiaoJing Su, LiSong Dong, Rui Chen, LiBin Zhang, TianYang Gai, YaJuan Su, YaYi Wei, Tian Chun Ye. Understanding and Mitigating Stress Memorization Technique of Induced Layout Dependencies for NMOS HKMG Device. IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY[J]. 2021, 第 7 作者9: 6-9, https://doaj.org/article/3269a09e61a045ebb74841b3612bc1ff.
[23] Liao, Lufeng, Li, Sikun, Wang, Xiangzhao, Zhang, Libin, Gao, Pengzheng, Wei, Yayi, Shi, Weijie. Critical pattern selection method for full-chip source and mask optimization. OPTICS EXPRESS[J]. 2020, 第 4 作者28(14): 20748-20763, 
[24] Bo Liu, Pengzheng Gao, Libin Zhang, Jiajin Zhang, Yuhong Zhao, Yayi Wei. Recognition and Visualization of Lithography Defects based on Transfer Learning. 微电子制造学报[J]. 2020, 第 3 作者3(3): 8-17, https://doaj.org/article/71b095566e7c410698cec7dcc5154a4e.
[25] 郭成, 粟雅娟, 陈睿, 董立松, 张利斌, 陈颖, 盖天洋, 韦亚一. 化学外延方式的嵌段共聚物定向自组装. 微纳电子技术[J]. 2020, 第 5 作者155-162, https://kns.cnki.net/KCMS/detail/detail.aspx?dbcode=CJFQ&dbname=CJFDLAST2020&filename=BDTQ202002012&v=MTQyOTk4ZVgxTHV4WVM3RGgxVDNxVHJXTTFGckNVUjdxZVorZHFGQ2ptVjdySUp5bmZmN0c0SE5ITXJZOUVab1I=.
[26] Liao Lufeng, Li Sikun, Wang Xiangzhao, Zhang Libin, Zhang Shuang, Gao Pengzheng, Wei Yayi, Shi Weijie. Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization. ACTA OPTICA SINICA[J]. 2020, 第 4 作者40(21): http://dx.doi.org/10.3788/AOS202040.2122001.
[27] Yang, Shang, Zhang, Libin, Wei, Yayi. Model-based image quality optimization for submicron direct laser writing. AIP ADVANCES[J]. 2020, 第 2 作者10(12): https://doaj.org/article/6d99d6e0deee454f86ac97121f857f05.
[28] 王英菲, 张青淳, 苏晓菁, 董立松, 陈睿, 张利斌, 盖天洋, 粟雅娟, 韦亚一, 叶甜春. 先进工艺下的版图邻近效应研究进展. 微电子学[J]. 2020, 第 6 作者50(5): 675-682, https://kns.cnki.net/KCMS/detail/detail.aspx?dbcode=CJFQ&dbname=CJFDLAST2020&filename=MINI202005012&v=MTMwNTExVDNxVHJXTTFGckNVUjdxZVp1ZHVGeWpnVkwvQktDVEZaN0c0SE5ITXFvOUVab1I4ZVgxTHV4WVM3RGg=.
[29] 杨双, 石新新, 伍宏, 粟雅娟, 董立松, 陈睿, 张利斌, 苏晓菁, 陈颖, 盖天洋, 郭成, 屈通, 韦亚一. 针对更精确电迁移预测应用的热耦合模型建模. 微电子学[J]. 2020, 第 7 作者50(5): 732-737, http://lib.cqvip.com/Qikan/Article/Detail?id=7103260439.
[30] 廖陆峰, 李思坤, 王向朝, 张利斌, 张双, 高澎铮, 韦亚一, 施伟杰. 基于衍射谱分析的全芯片光源掩模联合优化关键图形筛选. 光学学报[J]. 2020, 第 4 作者40(21): 126-136, 
[31] Hong, Peizhen, Zhao, Zhiguo, Luo, Jun, Xia, Zhiliang, Su, Xiaojing, Zhang, Libin, Li, Chunlong, Huo, Zongliang. An Improved Dimensional Measurement Method of Staircase Patterns With Higher Precision in 3D NAND. IEEE ACCESS[J]. 2020, 第 6 作者8: 140054-140061, https://doaj.org/article/e9da23ff1a4543e3bc9c99f11603f5dc.
[32] Zhang, Baolin, Liu, Weichen, Meng, Lingkuan, Zhang, Zhengping, Zhang, Libin, Wu, Xing, Dai, Junyan, Mao, Guoping, Wei, Yayi. Study of the perpendicular self-assembly of a novel high-chi block copolymer without any neutral layer on a silicon substrate. RSC ADVANCES[J]. 2019, 第 5 作者9(7): 3828-3837, 
[33] Su, Xiaojing, Shen, Dong, Wei, Yayi, Fan, Taian, Dong, Lisong, Zhang, Libin, Su, Yajuan, Chen, Rui, Ye, Tianchun. Probability prediction model for bridging defects induced by combined influences from lithography and etch variations. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2019, 第 6 作者18(2): 
[34] Zhang, Libin, Ma, Le, Chen, Rui, He, Jianfang, Su, Xiaojing, Dong, Lisong, Su, Yajuan, Wei, Yayi. Pattern quality and defect evaluation based on cross correlation and power spectral density methods. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B[J]. 2018, 第 1 作者36(5): https://www.webofscience.com/wos/woscc/full-record/WOS:000444809600019.
[35] He Jianfang, Dong Lisong, Zhang Libin, Zhao Lijun, Wei Yayi, Ye Tianchun, Kye J, Owa S. The Method of Optimizing Mask Parameters Suitable for Lithography Process. OPTICAL MICROLITHOGRAPHY XXXI. 2018, 第 3 作者10587: 
[36] Zhang, Libin, Dong, Lisong, Su, Xiaojing, Wei, Yayi, Ye, Tianchun. New alignment mark designs in single patterning and self-aligned double patterning. MICROELECTRONIC ENGINEERING[J]. 2017, 第 1 作者179: 18-24, http://dx.doi.org/10.1016/j.mee.2017.04.017.
[37] Zhang, Libin, Dong, Lisong, Su, Xiaojing, Wei, Yayi. Characteristic study of image-based alignment for increasing accuracy in lithography application. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B[J]. 2017, 第 1 作者35(6): https://www.webofscience.com/wos/woscc/full-record/WOS:000416602700049.
[38] Zhang Libin, Dong Lisong, Wei Yayi, Zhao Lijun, Liu Yansong, Su Xiaojing. An off-line roughness evaluation software and its application in quantitative calculation of wiggling based on low frequency power spectrum density method. 2017中国国际半导体技术大会 (CSTIC). 2017, 第 1 作者null(null): http://159.226.55.106/handle/172511/18272.
[39] Dong, Lisong, Zhang, Libin, Su, Xiaojing, He, Jianfang, Wei, Yayi. Optimization of the focus monitor mark in immersion lithography according to illumination type. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2017, 第 2 作者16(3): 
[40] Dong, Lisong, Zhang, Libin, Su, Xiaojing, Song, Zhiyang, Wei, Yayi, Ye, Tianchun. Optimization of resist parameters to improve the profile and process window of the contact pattern in advanced node. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS[J]. 2016, 第 2 作者15(4): https://www.webofscience.com/wos/woscc/full-record/WOS:000397068400011.

（1） 计算光刻与版图优化, 电子工业出版社, 2021-01, 第 4 作者

   

（1）Method to improve the overlay image contrast and optimize the sub-segmentation mark   Libin Zhang, Cong Lu, Yaobin Feng, Yayi Wei   2021-02-22
（2）Overlay mark sub structure design to improve the contrast   国际先进光刻技术研讨会   Libin Zhang, et al   2020-11-05