基本信息
邵淑英 女 硕导 中国科学院上海光学精密机械研究所
电子邮件： shaoshuying@siom.ac.cn
通信地址： 上海市嘉定区汇旺东路899号
邮政编码： 201800
电子邮件： shaoshuying@siom.ac.cn
通信地址： 上海市嘉定区汇旺东路899号
邮政编码： 201800
研究领域
光学工程、高端电子装备，半球谐振陀螺仪
招生信息
招生专业：
1.凝聚态物理
2.半球谐振陀螺优化仿真设计
教育背景
2002-03--2005-03 中科院上海光几所 博士学位
1999-09--2002-03 西北工业大学 硕士
1999-09--2002-03 西北工业大学 硕士
工作经历
2011-07-至今，中科院上海光学精密机械研究所, 副研究员
2008-10~2011-07,中科院上海光学精密机械研究所, 副研究员
2005-03~2008-10,中科院上海光学精密机械研究所, 助研
专利与奖励
奖励信息
（1） 上海市技术发明奖, 一等奖, 省级, 2017
（2） 军队科技进步二等奖, 二等奖, 国家级, 2012
（2） 军队科技进步二等奖, 二等奖, 国家级, 2012
专利成果
[1] 邵建达, 王建国, 易葵, 刘世杰, 田云先, 徐天柱, 刘昶, 潘靖宇, 邵淑英. 半球谐振子金属化镀膜均匀性的评估方法. CN: CN115420203A, 2022-12-02.
[2] 刘世杰, 潘靖宇, 王建国, 徐天柱, 田云先, 刘昶, 邵淑英. 带金属电极的石英基底的封接方法及其专用夹具. CN: CN114163145A, 2022-03-11.
[3] 郭猛, 贺洪波, 易葵, 邵淑英, 朱美萍. 一种中波红外增透膜设计及制备方法. CN: CN110794490A, 2020-02-14.
[4] 郭猛, 贺洪波, 易葵, 邵淑英, 胡国行, 李静平, 朱美萍. 一种短波宽带截止中波透过膜设计及制备方法. CN: CN110927963A, 2020-03-27.
[5] 邵淑英, 邵建达. 一种玻璃基片镀膜后面形可控的热处理方法. CN: CN106219955A, 2016-12-14.
[6] 邵淑英, 王虎, 郭猛, 柴英杰. 基于有限元模拟的大口径光学镀膜元件低频面形参数预测方法. CN: CN105808895A, 2016-07-27.
[7] 申雁鸣, 袁 磊, 邵淑英, 范正修, 贺洪波, 易葵, 邵建达. 薄膜应力测量装置及其测量方法. CN: CN101029849A, 2007-09-05.
[8] 申雁鸣, 袁 磊, 邵淑英, 范正修, 贺洪波, 易 葵, 邵建达. 薄膜应力测量装置. 中国: CN201043921, 2008-04-02.
[9] 申雁鸣, 朱美萍, 郭世海, 夏志林, 邵建达, 贺洪波, 易葵, 范正修, 邵淑英. 高精度薄膜应力实时测量装置. 中国: CN200972452, 2007.11.07.
[10] 申雁鸣, 朱美萍, 郭世海, 夏志林, 邵建达, 贺洪波, 易葵, 范正修, 邵淑英. 高精度薄膜应力实时测量装置及测量方法. CN: CN1971248A, 2007-05-30.
[11] 范树海, 贺洪波, 张冬青, 邵建达, 黄建兵, 邵淑英, 齐红基, 王建国. 透反型斩光器. CN: CN1645182A, 2005-07-27.
[2] 刘世杰, 潘靖宇, 王建国, 徐天柱, 田云先, 刘昶, 邵淑英. 带金属电极的石英基底的封接方法及其专用夹具. CN: CN114163145A, 2022-03-11.
[3] 郭猛, 贺洪波, 易葵, 邵淑英, 朱美萍. 一种中波红外增透膜设计及制备方法. CN: CN110794490A, 2020-02-14.
[4] 郭猛, 贺洪波, 易葵, 邵淑英, 胡国行, 李静平, 朱美萍. 一种短波宽带截止中波透过膜设计及制备方法. CN: CN110927963A, 2020-03-27.
[5] 邵淑英, 邵建达. 一种玻璃基片镀膜后面形可控的热处理方法. CN: CN106219955A, 2016-12-14.
[6] 邵淑英, 王虎, 郭猛, 柴英杰. 基于有限元模拟的大口径光学镀膜元件低频面形参数预测方法. CN: CN105808895A, 2016-07-27.
[7] 申雁鸣, 袁 磊, 邵淑英, 范正修, 贺洪波, 易葵, 邵建达. 薄膜应力测量装置及其测量方法. CN: CN101029849A, 2007-09-05.
[8] 申雁鸣, 袁 磊, 邵淑英, 范正修, 贺洪波, 易 葵, 邵建达. 薄膜应力测量装置. 中国: CN201043921, 2008-04-02.
[9] 申雁鸣, 朱美萍, 郭世海, 夏志林, 邵建达, 贺洪波, 易葵, 范正修, 邵淑英. 高精度薄膜应力实时测量装置. 中国: CN200972452, 2007.11.07.
[10] 申雁鸣, 朱美萍, 郭世海, 夏志林, 邵建达, 贺洪波, 易葵, 范正修, 邵淑英. 高精度薄膜应力实时测量装置及测量方法. CN: CN1971248A, 2007-05-30.
[11] 范树海, 贺洪波, 张冬青, 邵建达, 黄建兵, 邵淑英, 齐红基, 王建国. 透反型斩光器. CN: CN1645182A, 2005-07-27.
出版信息
发表论文
[1] Guo, Meng, Yi, Kui, Shao, Shuying, Zhang, Yuhui, Hu, Guohang, Zhao, Jiaoling, He, Hongbo, Shao, Jianda. Study on water absorption characteristics of cubic Y2O3 films. OPTICAL MATERIALS[J]. 2020, 109: http://dx.doi.org/10.1016/j.optmat.2020.110304.
[2] Guo, Meng, He, Hongbo, Yi, Kui, Shao, Shuying, Hu, Guohang, Shao, Jianda. Optical characteristics of ultrathin amorphous Ge films. CHINESE OPTICS LETTERS[J]. 2020, 18(10): 78-82, http://lib.cqvip.com/Qikan/Article/Detail?id=7103303992.
[3] 邵淑英, 郭猛, 易葵, 姜雄伟, 邵建达. 氟镓酸盐红外玻璃窗口多波段增透保护膜研制. 红外[J]. 2020, 41(1): 1-6, https://kns.cnki.net/KCMS/detail/detail.aspx?dbcode=CJFQ&dbname=CJFDLAST2020&filename=HWAI202001001&v=MTI0NDIxTHV4WVM3RGgxVDNxVHJXTTFGckNVUjdxZVp1ZHVGeXJrVTdyS0xUcktaN0c0SE5ITXJvOUZaWVI4ZVg=.
[4] 邵淑英, 易葵, 朱美萍, 范正修, 邵建达. 原子层沉积技术在纳米光子波导中的应用. 真空科学与技术学报[J]. 2017, 37(12): 1153-1159, http://lib.cqvip.com/Qikan/Article/Detail?id=674209969.
[5] 邵淑英. A Finite Element Analysis Method of Low Frequency Surface Figure Parameters ofCoating Components. 凝聚态物理学进展. 2016,
[6] 邵淑英, 柴英杰, 王虎, 郭猛, 易葵. 镀膜元件低频面形参数的有限元模拟及分析方法. 凝聚态物理学进展[J]. 2016, 5(2): 29-35, http://lib.cqvip.com/Qikan/Article/Detail?id=HS724052016002004.
[7] Qi, Hongji, Zhu, Meipin, Fang, Ming, Shao, Shuying, Wei, Chaoyang, Yi, Kui, Shao, Jianda. Development of high-power laser coatings. HIGH POWER LASER SCIENCE AND ENGINEERING[J]. 2013, 1(1): 36-43, http://lib.cqvip.com/Qikan/Article/Detail?id=72807683504849514849484854.
[8] Hongji Qi, Meipin Zhu, Ming Fang, Shuying Shao, Chaoyang Wei, Kui Yi, Jianda Shao. Development of high-power laser coatings. 高功率激光科学与工程：英文版[J]. 2013, 36-43, http://lib.cqvip.com/Qikan/Article/Detail?id=72807683504849514849484854.
[9] 蔺玲, 邵淑英, 李静平. 单斜相HfO_2薄膜弹性常数的第一性原理计算. 光学学报[J]. 2013, 33(1): 131001, http://ir.siom.ac.cn/handle/181231/14861.
[10] 胡达飞, 邵淑英, 方明, 齐红基, 易葵. 高功率激光器光学元件镀膜前后评价参数探讨. 中国激光[J]. 2010, 572-576, http://lib.cqvip.com/Qikan/Article/Detail?id=32921088.
[11] 朱冠超, 方明, 易葵, 朱美萍, 邵淑英, 范正修. 双光束在线实时测量光学薄膜应力的装置. 中国激光[J]. 2009, 2150-2153, http://lib.cqvip.com/Qikan/Article/Detail?id=31282224.
[12] Xiao, Qiling, He, Hongbo, Shao, Shuying, Shao, Jianda, Fan, Zhengxiu. Influences of deposition rate and oxygen partial pressure on residual stress and microstructure of YSZ thin films. THIN SOLID FILMS[J]. 2009, 517(15): 4295-4298, http://dx.doi.org/10.1016/j.tsf.2008.11.138.
[13] 方明, 邵淑英, 沈雪峰, 范正修, 邵建达. HfO2薄膜生长应力演化研究. 光学学报[J]. 2009, 1734-1739, http://lib.cqvip.com/Qikan/Article/Detail?id=30736300.
[14] Xiao, Qiling, Shao, Shuying, Shao, Jianda, Fan, Zhengxiu. Influences of Y2O3 dopant content on residual stress, structure, and optical properties of ZrO2 thin films. CHINESE OPTICS LETTERS[J]. 2009, 7(2): 162-164, http://lib.cqvip.com/Qikan/Article/Detail?id=29533676.
[15] 肖祁陵, 邵淑英, 邵建达, 范正修. 氧分压和沉积速率对YSZ薄膜残余应力的影响. 中国激光[J]. 2009, 1195-1199, http://lib.cqvip.com/Qikan/Article/Detail?id=30394160.
[16] Xiao QiLing, Shao ShuYing, He HongBo, Shao JianDa, Fan ZhengXiu. Influence of ytterbia content on residual stress and microstructure of Y2O3-ZrO2 thin films prepared by EB-PVD. CHINESEPHYSICSLETTERS[J]. 2008, 25(9): 3433-3435, http://lib.cqvip.com/Qikan/Article/Detail?id=28169773.
[17] Shen Yanming, Yu Hua, 姚建可, 邵淑英, 范正修, 贺洪波, 邵建达. Investigation on properties of TiO2 thin films deposited at different oxygen pressures. OPT. LASER TECHNOL.[J]. 2008, 40(3): 550, http://dx.doi.org/10.1016/j.optlastec.2007.09.003.
[18] Shen Yanming, Han Chaoxia, Shao Jianda, Shao Shuying, He Hongbo. Annealing effects on residual stress of HfO2/SiO2 multilayers. 中国光学快报：英文版[J]. 2008, 6(3): 225-227, http://lib.cqvip.com/Qikan/Article/Detail?id=26758922.
[19] Xiao Qi-Ling, Xu Cheng, 邵淑英, 邵建达, 范正修. Y 2 O 3 stabilized ZrO 2 thin films deposited by electron-beam evaporation: Optical properties, structure and residual stresses. VACUUM[J]. 2008, 83(2): 366, http://ir.siom.ac.cn/handle/181231/4732.
[20] Xiao, QiLing, Xu, Cheng, Shao, ShuYing, Shao, JianDa, Fan, ZhengXiu. Y2O3 stabilized ZrO2 thin films deposited by electron-beam evaporation: Optical properties, structure and residual stresses. VACUUM[J]. 2008, 83(2): 366-371, http://dx.doi.org/10.1016/j.vacuum.2008.05.031.
[21] 王善成, 方明, 易葵, 邵淑英, 范正修. 电子束蒸发镀膜速率控制. 中国激光[J]. 2008, 35(10): 1591-1594, http://lib.cqvip.com/Qikan/Article/Detail?id=28497962.
[22] Shen, Yanming, Han, Zhaoxia, Shao, Jianda, Shao, Shuying, He, Hongbo. Annealing effects on residual stress of WO2/SiO2 multilayers. CHINESE OPTICS LETTERS[J]. 2008, 6(3): 225-227, http://ir.siom.ac.cn/handle/181231/4712.
[23] Yanming Shen, Zhaoxia Han, Jianda Shao, Shuying Shao, Hongbo He. Annealing effects on residual stress of HfO2/SiO2 multilayers. 中国光学快报：英文版[J]. 2008, 6(3): 225-227, http://lib.cqvip.com/Qikan/Article/Detail?id=26758922.
[24] 肖祁陵, 邵淑英, 贺洪波, 邵建达, 范正修. Influence of Ytterbia Content on Residual Stress and Microstructure of Y2O3-ZrO2 Thin Films Prepared by EB-PVD. 中国物理快报：英文版[J]. 2008, 25(9): 3433-3435, http://lib.cqvip.com/Qikan/Article/Detail?id=28169773.
[25] 肖祁陵, 贺洪波, 邵淑英, 邵建达, 范正修. 沉积温度对氧化钇稳定氧化锆薄膜残余应力的影响. 光学学报[J]. 2008, 28(5): 1007-1011, http://lib.cqvip.com/Qikan/Article/Detail?id=27378141.
[26] Xiao Qi-Ling, 邵淑英, 贺洪波, 邵建达, 范正修. Influence of ytterbia content on residual stress and microstructure of Y2O3-ZrO2 thin films prepared by EB-PVD. CHIN. PHYS. LETT.[J]. 2008, 25(9): 3433, http://ir.siom.ac.cn/handle/181231/4730.
[27] 申雁鸣, 韩朝霞, 邵建达, 邵淑英, 贺洪波. 退火对HfO2/SiO2多层膜残余应力的影响. CHIN. OPT. LETT.[J]. 2008, 6(3): 225, http://ir.siom.ac.cn/handle/181231/4712.
[28] Shen, Yanming, Yu, Hua, Yao, Jianke, Shao, Shuying, Fan, Zhengxiu, He, Hongbo, Shao, Jianda. Investigation on properties of TiO2 thin films deposited at different oxygen pressures. OPTICS AND LASER TECHNOLOGY[J]. 2008, 40(3): 550-554, http://dx.doi.org/10.1016/j.optlastec.2007.09.003.
[29] 申雁鸣, 贺洪波, 邵淑英, 范正修, 邵建达. 薄膜厚度对HfO2薄膜残余应力的影响. 稀有金属材料与工程[J]. 2007, 36(3): 412, http://ir.siom.ac.cn/handle/181231/4614.
[30] 申雁鸣, 邵淑英, 邓震霞, 贺洪波, 邵建达, 范正修. Influences of Annealing on Residual Stress and Structure of HfO2 Films. 中国物理快报：英文版[J]. 2007, 24(10): 2963-2966, http://lib.cqvip.com/Qikan/Article/Detail?id=25743033.
[31] Shen, Yanming, Shao, Shuying, Yu, Hua, Fan, Zhengxiu, He, Hongbo, Shao, Jianda. Influences of oxygen partial pressure on structure and related properties of ZrO2 thin films prepared by electron beam evaporation deposition. APPLIED SURFACE SCIENCE[J]. 2007, 254(2): 552-556, http://dx.doi.org/10.1016/j.apsusc.2007.06.029.
[32] Shen Yanming, He Hongbo, Shao Shuying, Fan Zhengxiu, Shao Jianda. Influences of the film thickness on residual stress of the HfO2 thin films. RARE METAL MATERIALS AND ENGINEERING[J]. 2007, 36(3): 412-415, http://ir.siom.ac.cn/handle/181231/4614.
[33] 申雁鸣, 贺洪波, 邵淑英, 范正修, 邵建达. 薄膜厚度对HfO2薄膜残余应力的影响. 稀有金属材料与工程[J]. 2007, 36(3): 412, http://ir.siom.ac.cn/handle/181231/4614.
[34] Shen Yanming, 邵淑英, Yu Hua, 范正修, 贺洪波, 邵建达. Influences of oxygen partial pressure on structure and related properties of ZrO2 thin films prepared by electron beam evaporation deposition. APPL. SURF. SCI.[J]. 2007, 254(2): 552, http://dx.doi.org/10.1016/j.apsusc.2007.06.029.
[35] Shen Yan-Ming, 邵淑英, Deng Zhen-Xia, 贺洪波, 邵建达, 范正修. Influences of annealing on residual stress and structure of HfO2 films. CHIN. PHYS. LETT.[J]. 2007, 24(10): 2963, http://ir.siom.ac.cn/handle/181231/4516.
[36] Shen YanMing, Shao ShuYing, Deng ZhenXia, HE HongBo, Shao JianDa, Fan ZhengXiu. Influences of annealing on residual stress and structure of HfO2 films. CHINESE PHYSICS LETTERS[J]. 2007, 24(10): 2963-2966, http://lib.cqvip.com/Qikan/Article/Detail?id=25743033.
[37] 申雁鸣, 贺洪波, 邵淑英, 范正修. 沉积温度对电子束蒸发HfO2薄膜残余应力的影响. 中国激光[J]. 2006, 33(6): 827, http://ir.siom.ac.cn/handle/181231/4292.
[38] 申雁鸣, 贺洪波, 邵淑英, 范正修. 沉积温度对电子束蒸发HfO2薄膜残余应力的影响. 中国激光[J]. 2006, 33(6): 827, http://ir.siom.ac.cn/handle/181231/4292.
[39] 张东平, 邵淑英, 黄建兵, 占美琼, 范正修, 邵建达. 不同氧分压下电子束蒸发氧化锆薄膜的特性. 光电工程[J]. 2006, 33(6): 37-40, http://lib.cqvip.com/Qikan/Article/Detail?id=22146255.
[40] Zhang DP, Qi HJ, 邵淑英, 贺洪波, 邵建达, 范正修. Surface morphology and properties of zirconia thin films prepared at different deposition rates. SURF. ENG.[J]. 2006, 22(2): 157, http://ir.siom.ac.cn/handle/181231/4274.
[41] 邵淑英. 沉积参数及时效时间对SiO2薄膜中残余应力的影响. 光学学报. 2005,
[42] 邵淑英, 范正修, 邵建达. ZrO2／SiO2多层膜中膜厚组合周期数及基底材料对残余应力的影响. 物理学报[J]. 2005, 54(7): 3312, http://ir.siom.ac.cn/handle/181231/4114.
[43] 邵淑英, 范正修, 范瑞瑛, 邵建达. 薄膜应力研究. 激光与光电子学进展[J]. 2005, 42(1): 22, http://ir.siom.ac.cn/handle/181231/4144.
[44] 邵淑英, 范正修, 邵建达, 沈卫星, 江敏华. 氧分压对电子束蒸发SiO2薄膜机械性质和光学性质的影响. 光子学报[J]. 2005, 34(5): 742, http://ir.siom.ac.cn/handle/181231/4158.
[45] 申雁鸣, 贺洪波, 邵淑英, 范正修, 邵建达. 沉积温度对HfO2薄膜残余应力的影响. 强激光与粒子束[J]. 2005, 17(12): 1812, http://ir.siom.ac.cn/handle/181231/4486.
[46] 邵淑英, 范正修, 邵建达. ZrO2／SiO2多层膜中膜厚组合周期数及基底材料对残余应力的影响. 物理学报[J]. 2005, 54(7): 3312, http://ir.siom.ac.cn/handle/181231/4114.
[47] 邵淑英. 薄膜应力研究综述. 激光与光电子进展. 2005,
[48] 邵淑英, 田光磊, 范正修, 邵建达. 沉积参量及时效时间对SiO2薄膜残余应力的影响. 光学学报[J]. 2005, 25(1): 126, http://ir.siom.ac.cn/handle/181231/4140.
[49] 邵淑英, 田光磊, 范正修, 邵建达. 沉积参量及时效时间对SiO2薄膜残余应力的影响. 光学学报[J]. 2005, 25(1): 126, http://ir.siom.ac.cn/handle/181231/4140.
[50] 申雁鸣, 贺洪波, 邵淑英, 范正修, 邵建达. 沉积温度对HfO2薄膜残余应力的影响. 强激光与粒子束[J]. 2005, 17(12): 1812, http://ir.siom.ac.cn/handle/181231/4486.
[51] 邵淑英, 邵建达, 贺洪波, 范正修. Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods. OPTLETT[J]. 2005, 30(16): 2119, http://ir.siom.ac.cn/handle/181231/4112.
[52] 邵淑英, 范正修, 范瑞瑛, 邵建达. 薄膜应力研究. 激光与光电子学进展[J]. 2005, 42(1): 22, http://ir.siom.ac.cn/handle/181231/4144.
[53] 邵淑英, 范正修, 邵建达, 沈卫星, 江敏华. 氧分压对电子束蒸发SiO2薄膜机械性质和光学性质的影响. 光子学报[J]. 2005, 34(5): 742, http://ir.siom.ac.cn/handle/181231/4158.
[54] Shao, SY, Shao, JD, He, HB, Fan, ZX. Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods. OPTICS LETTERS[J]. 2005, 30(16): 2119-2121, http://ir.siom.ac.cn/handle/181231/4112.
[55] Shao SY, Shao JD, Zhang DP, Huang JB, Fan ZX, Chu J, Lai ZS, Wang LW, Xu SH. Influences of post-deposition annealing on the properties of the ZrO2 thin films prepared by electron beam evaporation. FIFTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS. 2004, 5774: 307-311,
[56] 范正修, 范瑞瑛, 贺洪波, 邵建达, 邵淑英. 沉积温度对电子束蒸发沉积ZrO2薄膜性质的影响. 中国激光[J]. 2004, 31(6): 701-704, http://lib.cqvip.com/Qikan/Article/Detail?id=10075042.
[57] 邵淑英, 范正修, 范瑞瑛, 邵建达. ZrO2薄膜残余应力实验研究. 光学学报[J]. 2004, 24(4): 437-441, http://lib.cqvip.com/Qikan/Article/Detail?id=9519855.
[58] Shao, SY, Fan, ZX, Shao, JD, He, HB. Evolutions of residual stress and microstructure in ZrO2 thin films deposited at different temperatures and rates. THIN SOLID FILMS[J]. 2003, 445(1): 59-62, http://dx.doi.org/10.1016/j.tsf.2003.08.051.
[2] Guo, Meng, He, Hongbo, Yi, Kui, Shao, Shuying, Hu, Guohang, Shao, Jianda. Optical characteristics of ultrathin amorphous Ge films. CHINESE OPTICS LETTERS[J]. 2020, 18(10): 78-82, http://lib.cqvip.com/Qikan/Article/Detail?id=7103303992.
[3] 邵淑英, 郭猛, 易葵, 姜雄伟, 邵建达. 氟镓酸盐红外玻璃窗口多波段增透保护膜研制. 红外[J]. 2020, 41(1): 1-6, https://kns.cnki.net/KCMS/detail/detail.aspx?dbcode=CJFQ&dbname=CJFDLAST2020&filename=HWAI202001001&v=MTI0NDIxTHV4WVM3RGgxVDNxVHJXTTFGckNVUjdxZVp1ZHVGeXJrVTdyS0xUcktaN0c0SE5ITXJvOUZaWVI4ZVg=.
[4] 邵淑英, 易葵, 朱美萍, 范正修, 邵建达. 原子层沉积技术在纳米光子波导中的应用. 真空科学与技术学报[J]. 2017, 37(12): 1153-1159, http://lib.cqvip.com/Qikan/Article/Detail?id=674209969.
[5] 邵淑英. A Finite Element Analysis Method of Low Frequency Surface Figure Parameters ofCoating Components. 凝聚态物理学进展. 2016,
[6] 邵淑英, 柴英杰, 王虎, 郭猛, 易葵. 镀膜元件低频面形参数的有限元模拟及分析方法. 凝聚态物理学进展[J]. 2016, 5(2): 29-35, http://lib.cqvip.com/Qikan/Article/Detail?id=HS724052016002004.
[7] Qi, Hongji, Zhu, Meipin, Fang, Ming, Shao, Shuying, Wei, Chaoyang, Yi, Kui, Shao, Jianda. Development of high-power laser coatings. HIGH POWER LASER SCIENCE AND ENGINEERING[J]. 2013, 1(1): 36-43, http://lib.cqvip.com/Qikan/Article/Detail?id=72807683504849514849484854.
[8] Hongji Qi, Meipin Zhu, Ming Fang, Shuying Shao, Chaoyang Wei, Kui Yi, Jianda Shao. Development of high-power laser coatings. 高功率激光科学与工程：英文版[J]. 2013, 36-43, http://lib.cqvip.com/Qikan/Article/Detail?id=72807683504849514849484854.
[9] 蔺玲, 邵淑英, 李静平. 单斜相HfO_2薄膜弹性常数的第一性原理计算. 光学学报[J]. 2013, 33(1): 131001, http://ir.siom.ac.cn/handle/181231/14861.
[10] 胡达飞, 邵淑英, 方明, 齐红基, 易葵. 高功率激光器光学元件镀膜前后评价参数探讨. 中国激光[J]. 2010, 572-576, http://lib.cqvip.com/Qikan/Article/Detail?id=32921088.
[11] 朱冠超, 方明, 易葵, 朱美萍, 邵淑英, 范正修. 双光束在线实时测量光学薄膜应力的装置. 中国激光[J]. 2009, 2150-2153, http://lib.cqvip.com/Qikan/Article/Detail?id=31282224.
[12] Xiao, Qiling, He, Hongbo, Shao, Shuying, Shao, Jianda, Fan, Zhengxiu. Influences of deposition rate and oxygen partial pressure on residual stress and microstructure of YSZ thin films. THIN SOLID FILMS[J]. 2009, 517(15): 4295-4298, http://dx.doi.org/10.1016/j.tsf.2008.11.138.
[13] 方明, 邵淑英, 沈雪峰, 范正修, 邵建达. HfO2薄膜生长应力演化研究. 光学学报[J]. 2009, 1734-1739, http://lib.cqvip.com/Qikan/Article/Detail?id=30736300.
[14] Xiao, Qiling, Shao, Shuying, Shao, Jianda, Fan, Zhengxiu. Influences of Y2O3 dopant content on residual stress, structure, and optical properties of ZrO2 thin films. CHINESE OPTICS LETTERS[J]. 2009, 7(2): 162-164, http://lib.cqvip.com/Qikan/Article/Detail?id=29533676.
[15] 肖祁陵, 邵淑英, 邵建达, 范正修. 氧分压和沉积速率对YSZ薄膜残余应力的影响. 中国激光[J]. 2009, 1195-1199, http://lib.cqvip.com/Qikan/Article/Detail?id=30394160.
[16] Xiao QiLing, Shao ShuYing, He HongBo, Shao JianDa, Fan ZhengXiu. Influence of ytterbia content on residual stress and microstructure of Y2O3-ZrO2 thin films prepared by EB-PVD. CHINESEPHYSICSLETTERS[J]. 2008, 25(9): 3433-3435, http://lib.cqvip.com/Qikan/Article/Detail?id=28169773.
[17] Shen Yanming, Yu Hua, 姚建可, 邵淑英, 范正修, 贺洪波, 邵建达. Investigation on properties of TiO2 thin films deposited at different oxygen pressures. OPT. LASER TECHNOL.[J]. 2008, 40(3): 550, http://dx.doi.org/10.1016/j.optlastec.2007.09.003.
[18] Shen Yanming, Han Chaoxia, Shao Jianda, Shao Shuying, He Hongbo. Annealing effects on residual stress of HfO2/SiO2 multilayers. 中国光学快报：英文版[J]. 2008, 6(3): 225-227, http://lib.cqvip.com/Qikan/Article/Detail?id=26758922.
[19] Xiao Qi-Ling, Xu Cheng, 邵淑英, 邵建达, 范正修. Y 2 O 3 stabilized ZrO 2 thin films deposited by electron-beam evaporation: Optical properties, structure and residual stresses. VACUUM[J]. 2008, 83(2): 366, http://ir.siom.ac.cn/handle/181231/4732.
[20] Xiao, QiLing, Xu, Cheng, Shao, ShuYing, Shao, JianDa, Fan, ZhengXiu. Y2O3 stabilized ZrO2 thin films deposited by electron-beam evaporation: Optical properties, structure and residual stresses. VACUUM[J]. 2008, 83(2): 366-371, http://dx.doi.org/10.1016/j.vacuum.2008.05.031.
[21] 王善成, 方明, 易葵, 邵淑英, 范正修. 电子束蒸发镀膜速率控制. 中国激光[J]. 2008, 35(10): 1591-1594, http://lib.cqvip.com/Qikan/Article/Detail?id=28497962.
[22] Shen, Yanming, Han, Zhaoxia, Shao, Jianda, Shao, Shuying, He, Hongbo. Annealing effects on residual stress of WO2/SiO2 multilayers. CHINESE OPTICS LETTERS[J]. 2008, 6(3): 225-227, http://ir.siom.ac.cn/handle/181231/4712.
[23] Yanming Shen, Zhaoxia Han, Jianda Shao, Shuying Shao, Hongbo He. Annealing effects on residual stress of HfO2/SiO2 multilayers. 中国光学快报：英文版[J]. 2008, 6(3): 225-227, http://lib.cqvip.com/Qikan/Article/Detail?id=26758922.
[24] 肖祁陵, 邵淑英, 贺洪波, 邵建达, 范正修. Influence of Ytterbia Content on Residual Stress and Microstructure of Y2O3-ZrO2 Thin Films Prepared by EB-PVD. 中国物理快报：英文版[J]. 2008, 25(9): 3433-3435, http://lib.cqvip.com/Qikan/Article/Detail?id=28169773.
[25] 肖祁陵, 贺洪波, 邵淑英, 邵建达, 范正修. 沉积温度对氧化钇稳定氧化锆薄膜残余应力的影响. 光学学报[J]. 2008, 28(5): 1007-1011, http://lib.cqvip.com/Qikan/Article/Detail?id=27378141.
[26] Xiao Qi-Ling, 邵淑英, 贺洪波, 邵建达, 范正修. Influence of ytterbia content on residual stress and microstructure of Y2O3-ZrO2 thin films prepared by EB-PVD. CHIN. PHYS. LETT.[J]. 2008, 25(9): 3433, http://ir.siom.ac.cn/handle/181231/4730.
[27] 申雁鸣, 韩朝霞, 邵建达, 邵淑英, 贺洪波. 退火对HfO2/SiO2多层膜残余应力的影响. CHIN. OPT. LETT.[J]. 2008, 6(3): 225, http://ir.siom.ac.cn/handle/181231/4712.
[28] Shen, Yanming, Yu, Hua, Yao, Jianke, Shao, Shuying, Fan, Zhengxiu, He, Hongbo, Shao, Jianda. Investigation on properties of TiO2 thin films deposited at different oxygen pressures. OPTICS AND LASER TECHNOLOGY[J]. 2008, 40(3): 550-554, http://dx.doi.org/10.1016/j.optlastec.2007.09.003.
[29] 申雁鸣, 贺洪波, 邵淑英, 范正修, 邵建达. 薄膜厚度对HfO2薄膜残余应力的影响. 稀有金属材料与工程[J]. 2007, 36(3): 412, http://ir.siom.ac.cn/handle/181231/4614.
[30] 申雁鸣, 邵淑英, 邓震霞, 贺洪波, 邵建达, 范正修. Influences of Annealing on Residual Stress and Structure of HfO2 Films. 中国物理快报：英文版[J]. 2007, 24(10): 2963-2966, http://lib.cqvip.com/Qikan/Article/Detail?id=25743033.
[31] Shen, Yanming, Shao, Shuying, Yu, Hua, Fan, Zhengxiu, He, Hongbo, Shao, Jianda. Influences of oxygen partial pressure on structure and related properties of ZrO2 thin films prepared by electron beam evaporation deposition. APPLIED SURFACE SCIENCE[J]. 2007, 254(2): 552-556, http://dx.doi.org/10.1016/j.apsusc.2007.06.029.
[32] Shen Yanming, He Hongbo, Shao Shuying, Fan Zhengxiu, Shao Jianda. Influences of the film thickness on residual stress of the HfO2 thin films. RARE METAL MATERIALS AND ENGINEERING[J]. 2007, 36(3): 412-415, http://ir.siom.ac.cn/handle/181231/4614.
[33] 申雁鸣, 贺洪波, 邵淑英, 范正修, 邵建达. 薄膜厚度对HfO2薄膜残余应力的影响. 稀有金属材料与工程[J]. 2007, 36(3): 412, http://ir.siom.ac.cn/handle/181231/4614.
[34] Shen Yanming, 邵淑英, Yu Hua, 范正修, 贺洪波, 邵建达. Influences of oxygen partial pressure on structure and related properties of ZrO2 thin films prepared by electron beam evaporation deposition. APPL. SURF. SCI.[J]. 2007, 254(2): 552, http://dx.doi.org/10.1016/j.apsusc.2007.06.029.
[35] Shen Yan-Ming, 邵淑英, Deng Zhen-Xia, 贺洪波, 邵建达, 范正修. Influences of annealing on residual stress and structure of HfO2 films. CHIN. PHYS. LETT.[J]. 2007, 24(10): 2963, http://ir.siom.ac.cn/handle/181231/4516.
[36] Shen YanMing, Shao ShuYing, Deng ZhenXia, HE HongBo, Shao JianDa, Fan ZhengXiu. Influences of annealing on residual stress and structure of HfO2 films. CHINESE PHYSICS LETTERS[J]. 2007, 24(10): 2963-2966, http://lib.cqvip.com/Qikan/Article/Detail?id=25743033.
[37] 申雁鸣, 贺洪波, 邵淑英, 范正修. 沉积温度对电子束蒸发HfO2薄膜残余应力的影响. 中国激光[J]. 2006, 33(6): 827, http://ir.siom.ac.cn/handle/181231/4292.
[38] 申雁鸣, 贺洪波, 邵淑英, 范正修. 沉积温度对电子束蒸发HfO2薄膜残余应力的影响. 中国激光[J]. 2006, 33(6): 827, http://ir.siom.ac.cn/handle/181231/4292.
[39] 张东平, 邵淑英, 黄建兵, 占美琼, 范正修, 邵建达. 不同氧分压下电子束蒸发氧化锆薄膜的特性. 光电工程[J]. 2006, 33(6): 37-40, http://lib.cqvip.com/Qikan/Article/Detail?id=22146255.
[40] Zhang DP, Qi HJ, 邵淑英, 贺洪波, 邵建达, 范正修. Surface morphology and properties of zirconia thin films prepared at different deposition rates. SURF. ENG.[J]. 2006, 22(2): 157, http://ir.siom.ac.cn/handle/181231/4274.
[41] 邵淑英. 沉积参数及时效时间对SiO2薄膜中残余应力的影响. 光学学报. 2005,
[42] 邵淑英, 范正修, 邵建达. ZrO2／SiO2多层膜中膜厚组合周期数及基底材料对残余应力的影响. 物理学报[J]. 2005, 54(7): 3312, http://ir.siom.ac.cn/handle/181231/4114.
[43] 邵淑英, 范正修, 范瑞瑛, 邵建达. 薄膜应力研究. 激光与光电子学进展[J]. 2005, 42(1): 22, http://ir.siom.ac.cn/handle/181231/4144.
[44] 邵淑英, 范正修, 邵建达, 沈卫星, 江敏华. 氧分压对电子束蒸发SiO2薄膜机械性质和光学性质的影响. 光子学报[J]. 2005, 34(5): 742, http://ir.siom.ac.cn/handle/181231/4158.
[45] 申雁鸣, 贺洪波, 邵淑英, 范正修, 邵建达. 沉积温度对HfO2薄膜残余应力的影响. 强激光与粒子束[J]. 2005, 17(12): 1812, http://ir.siom.ac.cn/handle/181231/4486.
[46] 邵淑英, 范正修, 邵建达. ZrO2／SiO2多层膜中膜厚组合周期数及基底材料对残余应力的影响. 物理学报[J]. 2005, 54(7): 3312, http://ir.siom.ac.cn/handle/181231/4114.
[47] 邵淑英. 薄膜应力研究综述. 激光与光电子进展. 2005,
[48] 邵淑英, 田光磊, 范正修, 邵建达. 沉积参量及时效时间对SiO2薄膜残余应力的影响. 光学学报[J]. 2005, 25(1): 126, http://ir.siom.ac.cn/handle/181231/4140.
[49] 邵淑英, 田光磊, 范正修, 邵建达. 沉积参量及时效时间对SiO2薄膜残余应力的影响. 光学学报[J]. 2005, 25(1): 126, http://ir.siom.ac.cn/handle/181231/4140.
[50] 申雁鸣, 贺洪波, 邵淑英, 范正修, 邵建达. 沉积温度对HfO2薄膜残余应力的影响. 强激光与粒子束[J]. 2005, 17(12): 1812, http://ir.siom.ac.cn/handle/181231/4486.
[51] 邵淑英, 邵建达, 贺洪波, 范正修. Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods. OPTLETT[J]. 2005, 30(16): 2119, http://ir.siom.ac.cn/handle/181231/4112.
[52] 邵淑英, 范正修, 范瑞瑛, 邵建达. 薄膜应力研究. 激光与光电子学进展[J]. 2005, 42(1): 22, http://ir.siom.ac.cn/handle/181231/4144.
[53] 邵淑英, 范正修, 邵建达, 沈卫星, 江敏华. 氧分压对电子束蒸发SiO2薄膜机械性质和光学性质的影响. 光子学报[J]. 2005, 34(5): 742, http://ir.siom.ac.cn/handle/181231/4158.
[54] Shao, SY, Shao, JD, He, HB, Fan, ZX. Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods. OPTICS LETTERS[J]. 2005, 30(16): 2119-2121, http://ir.siom.ac.cn/handle/181231/4112.
[55] Shao SY, Shao JD, Zhang DP, Huang JB, Fan ZX, Chu J, Lai ZS, Wang LW, Xu SH. Influences of post-deposition annealing on the properties of the ZrO2 thin films prepared by electron beam evaporation. FIFTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS. 2004, 5774: 307-311,
[56] 范正修, 范瑞瑛, 贺洪波, 邵建达, 邵淑英. 沉积温度对电子束蒸发沉积ZrO2薄膜性质的影响. 中国激光[J]. 2004, 31(6): 701-704, http://lib.cqvip.com/Qikan/Article/Detail?id=10075042.
[57] 邵淑英, 范正修, 范瑞瑛, 邵建达. ZrO2薄膜残余应力实验研究. 光学学报[J]. 2004, 24(4): 437-441, http://lib.cqvip.com/Qikan/Article/Detail?id=9519855.
[58] Shao, SY, Fan, ZX, Shao, JD, He, HB. Evolutions of residual stress and microstructure in ZrO2 thin films deposited at different temperatures and rates. THIN SOLID FILMS[J]. 2003, 445(1): 59-62, http://dx.doi.org/10.1016/j.tsf.2003.08.051.
科研活动
（ 1 ） 薄膜宏观应力（G08）, 负责人, 国家任务, 2007-10--2011-02
（ 2 ） AM100919, 参与, 国家任务, 2009-01--2014-02
（ 3 ） 193nm薄膜以及135nm薄膜的研制, 参与, 国家任务, 2002-12--2005-12
（ 4 ） 偏振膜, 参与, 国家任务, 2004-01--2005-12
（ 5 ） A101957-XXXX(A10), 参与, 国家任务, 2009-10--2012-02
（ 6 ） 1Z05010806.1-2010HT-C01, 参与, 国家任务, 2010-01--2012-02
（ 7 ） 1ZCA10197501, 参与, 国家任务, 2010-12--2012-02
（ 8 ） 1ZJPPT-5-115-186601, 参与, 国家任务, 2010-12--2013-02
（ 9 ） 激光多层膜光学元件, 参与, 国家任务, 2001-01--2005-12
（ 10 ） 介质薄膜(B07), 参与, 国家任务, 2007-07--2010-02
（ 11 ） 1ZXXXX01, 参与, 国家任务, 2008-07--2010-02
（ 12 ） XXXX081022, 参与, 国家任务, 2008-07--2010-02
（ 13 ） 激光薄膜(G09), 参与, 国家任务, 2008-11--2012-02
（ 14 ） 强激光材料(CK09), 参与, 中国科学院计划, 2009-01--2019-12
（15） 光学材料应力控制技术验证，负责人，0902专项，2013-2015
（16）中高精度半球谐振陀螺仪原理样机研制，主要人员，2018-2022
（17）微振动用HRG关键技术研究，联合基金，主要人员，2023-2024
参与会议
（1）Influence of subsurface defects on 355 nm laser damage resistance of monolayer and multilayer coatings Guohang Hu, Shuying Shao, Minghong Yang, Jianda Shao, Yuan’an Zhao, Kui Yi, Zhengxiu Fan 2009-09-19