基本信息
赵有文 男 博导 中国科学院半导体研究所
电子邮件: zhaoyw@semi.ac.cn
通信地址: 北京市海淀区清华东路甲35号中科院半导体所1号楼120A房间
邮政编码: 100083
电子邮件: zhaoyw@semi.ac.cn
通信地址: 北京市海淀区清华东路甲35号中科院半导体所1号楼120A房间
邮政编码: 100083
教育背景
1996-08--1999-08 香港大学 理学博士1986-09--1989-03 河北半导体研究所 工学硕士学位1982-09--1986-07 兰州大学 理学学士学位
工作经历
工作简历
2000-03~2011-08,中国科学院半导体研究所, 研究员1996-08~1999-08,香港大学, 理学博士1989-03~1996-07,河北半导体研究所, 工程师1986-09~1989-03,河北半导体研究所, 工学硕士学位1982-09~1986-07,兰州大学, 理学学士学位
教授课程
半导体材料
专利与奖励
奖励信息
(1) 磷化铟单晶缺陷, 二等奖, 省级, 2010(2) InP和ZnO材料缺陷研究, 一等奖, 部委级, 2003(3) 化合物半导体InP, 二等奖, 国家级, 2002
专利成果
( 1 ) 对砷化铟中III族铟和V族砷氧化物的检验方法及定量方法, 2023, 第 2 作者, 专利号: CN116380959A( 2 ) 一种抛光后砷化铟晶片的亚表面损伤的腐蚀检测方法, 2023, 第 3 作者, 专利号: CN116380891A( 3 ) 一种控制砷化铟中Ⅲ族铟和Ⅴ族砷氧化物的方法, 2022, 第 2 作者, 专利号: CN115522263A( 4 ) 锑化镓单晶表面的氧化层厚度的控制方法, 2022, 第 2 作者, 专利号: CN114203526A( 5 ) 锑化镓晶片湿法腐蚀方法, 2022, 第 2 作者, 专利号: CN114108102A( 6 ) 在GaSb衬底上生长InAs层的生长速度测定方法, 2021, 第 9 作者, 专利号: CN113358677A( 7 ) 一种去除锑化镓单晶片残余应力的退火方法, 2021, 第 2 作者, 专利号: CN112899790A( 8 ) 籽晶保护装置及单晶生长方法, 2020, 第 2 作者, 专利号: CN108546986B( 9 ) 背表面场GaSb热光伏电池及其制备方法, 2020, 第 2 作者, 专利号: CN108831933B( 10 ) 掺硫砷化铟体单晶片、其腐蚀方法及腐蚀剂, 2020, 第 2 作者, 专利号: CN110965129A( 11 ) 砷化铟单晶片位错腐蚀液及位错腐蚀检测方法, 2019, 第 2 作者, 专利号: CN110205681A( 12 ) 背表面场GaSb热光伏电池及其制备方法, 2018, 第 2 作者, 专利号: CN108831933A( 13 ) 籽晶保护装置及单晶生长方法, 2018, 第 2 作者, 专利号: CN108546986A( 14 ) 一种制备P型锰掺杂的砷化铟单晶的方法, 2018, 第 2 作者, 专利号: CN108085744A( 15 ) 采用闭管化学气相传输方式生长Ga 2 O 3 单晶的方法, 2017, 第 4 作者, 专利号: CN107400919A( 16 ) 采用闭管化学气相传输方式生长Ga 2 O 3 单晶的方法, 2017, 第 4 作者, 专利号: CN107400919A( 17 ) 太阳能电池减反钝化膜及其制备方法及太阳能电池片, 2017, 第 2 作者, 专利号: CN107068774A( 18 ) 偏111晶向锗单晶片位错显示用腐蚀液及腐蚀方法, 2015, 第 2 作者, 专利号: CN104862702A( 19 ) 降低衬底表面残留杂质浓度的方法, 2013, 第 2 作者, 专利号: CN103021833A( 20 ) ZnO体单晶的Sb离子注入掺杂及退火激活方法, 2012, 第 2 作者, 专利号: CN102691108A( 21 ) 多晶硅碱性制绒方法, 2012, 第 2 作者, 专利号: CN102437044A( 22 ) 生长半绝缘砷化镓的石英管及在砷化镓中掺碳的方法, 2009, 第 3 作者, 专利号: CN101603208A( 23 ) 氧化锌体单晶生长过程中的直接掺杂方法, 2009, 第 2 作者, 专利号: CN101440516A( 24 ) 动态控制高温炉内压力的方法, 2009, 第 2 作者, 专利号: CN101440517A( 25 ) 闭管化学气相传输法生长ZnO单晶方法, 2007, 第 1 作者, 专利号: CN1978713A( 26 ) 退火非掺杂磷化铟制备半绝缘衬底的方法, 2006, 第 1 作者, 专利号: CN1265444C( 27 ) 晶片热处理用的样品架, 2003, 第 1 作者, 专利号: CN2593359Y( 28 ) 磷化铟单晶片的抛光工艺, 2003, 第 2 作者, 专利号: CN1402309A
出版信息
发表论文
(1) High power GaSb-based superluminescent diode with cascade cavity suppression waveguide geometry and ultra-low antireflection coating, APPLIED PHYSICS LETTERS, 2023, 第 8 作者(2) High-Power, High-Efficiency GaSb-Based Laser with Compositionally Linearly Graded AlGaAsSb Layer, APPLIED SCIENCES-BASEL, 2023, 第 8 作者(3) Oxidation related particles on GaSb (1 0 0) substrate surfaces, JOURNAL OF CRYSTAL GROWTH, 2022, 第 11 作者(4) Evaluation of LEC and VGF-InAs substrates through surface defect characterization and epitaxy growth, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2021, 第 2 作者(5) Residual stress distribution and flatness of dislocation-free Te-GaSb (100) substrate, JAPANESE JOURNAL OF APPLIED PHYSICS, 2021, 第 11 作者(6) Evaluation of residual stress in InP and InAs (100) substrates obtained from single crystals grown by LEC and VGF methods, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2021, 第 2 作者(7) Evaluation of LEC and VGF-InAs substrates through surface defect characyerization and epitaxy growth), Mater. Sci. Semicond. Pro., 2021, 第 1 作者(8) BAs晶体生长研究进展, Research Progress of BAs Crystal Growth, 人工晶体学报, 2021, 第 2 作者(9) 面向长距离通讯1550nm垂直腔面发射激光器的研究, 1550nm VCSELs for long-reach optical interconnects, 红外与毫米波学报, 2020, 第 6 作者(10) A comparison of defects between InAs single crystals grown by Le\EC and VGF methods, Journal of Electronic Materials, 2020, 第 1 作者(11) 1550 nm VCSELs for long-reach optical interconnects, JOURNAL OF INFRARED AND MILLIMETER WAVES, 2020, 第 6 作者(12) VGF growth of high quality InAs single crystals with low dislocation density, JOURNAL OF CRYSTAL GROWTH, 2020, 第 8 作者(13) HCl-H2SO4-H2O solution etching behavior of InAs (1 0 0) surface, JOURNAL OF CRYSTAL GROWTH, 2020, 第 11 作者(14) A Comparison of Defects Between InAs Single Crystals Grown by LEC and VGF Methods, JOURNAL OF ELECTRONIC MATERIALS, 2020, 第 11 作者(15) Electrical conduction of carbon-ion-implanted InAs, Mater. Res. express, 2019, 第 11 作者(16) Electrical conduction of C-implanted InAs single crystal, MATERIALS RESEARCH EXPRESS, 2019, 第 2 作者(17) Wet etching generation of dislocation pits with clear facets in LEC-InAs single crystals, JOURNAL OF CRYSTAL GROWTH, 2019, 第 6 作者(18) Mechanism of free electron concentration saturation phenomenon in Te-GaSb single crystal, CHINESE PHYSICS B, 2019, 第 11 作者(19) Photoluminescene study acceptor defects in lightly doped n type GaSb single crystals, Photoluminescene study acceptor defects in lightly doped n type GaSb single crystals, 半导体学报:英文版, 2019, 第 2 作者(20) Photoluminescene study acceptor defects in lightly doped n type GaSb single crystals, JOURNAL OF SEMICONDUCTORS, 2019, 第 2 作者(21) Mechanism of free electron concentration saturation phenomenon in Te-GaSb single crystal, Mechanism of free electron concentration saturation phenomenon in Te-GaSb single crystal, 中国物理B:英文版, 2019, 第 11 作者(22) Impurity band conduction in Mn-doped p type InAs single crystal, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2018, 第 2 作者(23) LVM Spectroscopy Investigation of Complex Defects in InAs Single Crystals Grown by the LEC Method, JOURNAL OF ELECTRONIC MATERIALS, 2018, 第 2 作者(24) 退火Te-GaSb的电学性质, Journal of Semiconductors, 2017, 第 11 作者(25) Carbon agent chemical vapor transport growth og Ga2O3 crystal, Journal of Semiconductors, 2017, 第 11 作者(26) Electrical and optical property of annealed Te-doped GaSb, JOURNAL OF SEMICONDUCTORS, 2017, 第 11 作者(27) 低位错密度4 inchGaSb(100)单晶生长及高质量衬底制备, Growth of 4 inch Diameter GaSb (100) Single Crystal with Low Dislocation Density and High Quality Substrate Preparation, 人工晶体学报, 2017, 第 14 作者(28) Performance improvement of c-Si solar cell by a combination of SiNx/SiOx passivation and double P-diffusion gettering treatment, Performance improvement of c-Si solar cell by a combination of SiNx/SiOx passivation and double P-diffusion gettering treatment, 半导体学报:英文版, 2017, 第 2 作者(29) 4英寸低位错密度GaSb单晶生长及高质量衬底制备, 人工晶体学报, 2017, 第 11 作者(30) Enhancement of below gap transmission of InAs single crystal via suppression of native defects, MATERIALS RESEARCH EXPRESS, 2017, 第 2 作者(31) 4 inch低位错密度InP单晶的VGF生长及性质研究, VGF Growth and Property of 4 inch Diameter InP Single Crystals with Low Dislocation Density, 人工晶体学报, 2017, 第 1 作者(32) Performance improvement of c-Si solar cell by a combination of SiNx/SiOx passivation and double P-diffusion gettering treatment, Performance improvement of c-Si solar cell by a combination of SiNx/SiOx passivation and double P-diffusion gettering treatment, JOURNAL OF SEMICONDUCTORS, 2017, 第 11 作者(33) 4英寸低位错InP单晶的VGF法生长及其性质研究, 人工晶体学报, 2017, 第 1 作者(34) 通过消除原生缺陷提高InAs单晶的透光率, Mater. Res. Express, 2017, 第 11 作者(35) N-type GaSb single crystals with high below-band gap transmission, CHINESE PHYSICS B, 2017, 第 11 作者(36) GaSb晶片表面残留杂质分析, Residual Impurities Analysis on the Surface of Gallium Atimonide Wafers, 半导体光电, 2016, 第 7 作者(37) Evaluation of four inch diameter VGF-Ge substrates used for manufacturing multi-junction solar cell, JOURNAL OF SEMICONDUCTORS, 2016, 第 6 作者(38) Thermally induced native defect transform in annealed GaSb, CHINESE PHYSICS B, 2016, 第 11 作者(39) 晶硅电池的黑斑缺陷, 半导体光电, 2016, 第 11 作者(40) GaSb原生缺陷的热致转变, Chin. Phys. B, 2015, 第 11 作者(41) C H complex defects and their influence in ZnO single crystal, CHINESE PHYSICS B, 2015, 第 11 作者(42) 不同晶向GaSb晶片表面化学组分及形貌分析, Analysis on Chemical Constituents and Surface Morphology of the Gallium Atimonide Wafers with Different Crystal Orientations, 半导体光电, 2015, 第 7 作者(43) Chemical and electrical properties of (NH_4)_2S passivated GaSb surface, JOURNAL OF SEMICONDUCTORS, 2015, 第 10 作者(44) Improved surface and electrical properties of passivated GaSb with less alkaline sulfide solution, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2015, 第 11 作者(45) Evaluation of four inch diameter VGF-Ge substrate used for manufacturing Multi-junction Solar Cell, Journal of Semiconductor, 2015, 第 11 作者(46) Implantation induced defects and electrical properties of Sb-implanted ZnO, SCIENCE CHINA-TECHNOLOGICAL SCIENCES, 2015, 第 7 作者(47) AlN原料的钨网炉高温提纯, Purification of AlN Source Material Using a Tungsten Mesh Furnace, 材料科学与工程学报, 2015, 第 7 作者(48) Analysis of solar cells fabricated from UMG-Si purified by a novel metallurgical method, Semicond. Sci. Technol, Semiconductor Science and Technology, 2013, 第 1 作者(49) Improvement of the surface quality of semi-insulating InP substrates through a novel etching and cleaning method, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2013, 第 2 作者(50) Synthesis of chalcopyrite CuIn1���xGaxSe2 alloys for photovoltaic application by a novel melting method, MATERIALS LETTERS, 2013, 第 2 作者(51) The fabrication of large-area upgraded metallurgical grade multi-crystalline silicon solar cells in a production line, MATERIALS SCIENCE FORUM, 2013, 第 2 作者(52) Analysis of solar cells fabricated from UMG-Si purified by a novel metallurgical method, SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2013, 第 2 作者(53) Large scale purification of metallurgical silicon for solar cell by using electron beam melting, JOURNAL OF CRYSTAL GROWTH, 2012, 第 3 作者(54) Purification of metallurgical silicon through directional solidification in a large cold crucible, JOURNAL OF CRYSTAL GROWTH, 2012, 第 3 作者(55) Defect properties of as-grown and electron-irradiated te-doped gasb studied by positron annihilation, SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2011, 第 6 作者(56) Residual impurities and electrical properties of undoped LEC InAs single crystals, Residual impurities and electrical properties of undoped LEC InAs single crystals, JOURNAL OF SEMICONDUCTORS, 2010, 第 2 作者(57) 非掺半绝缘InP材料的电子辐照缺陷研究, Study of electron irradiation-induced defects in undoped semi-insulating InP, 四川大学学报:自然科学版, 2010, 第 3 作者(58) Donor defect in P-diffused bulk ZnO single crystal, 29th international conference on physics of semiconductors, 2010, (59) InAs单晶衬底的表面形貌和化学成分分析, Analysis of Surface Morphology and Chemical Composition of InAs Single Crystal Substrate, 人工晶体学报, 2010, 第 2 作者(60) Residual impurities and electrical properties of undoped LEC InAs single crystals, Residual impurities and electrical properties of undoped LEC InAs single crystals, 半导体学报, 2010, 第 2 作者(61) Luminescence spectroscopy of ion implanted AlN bulk single crystal, Luminescence spectroscopy of ion implanted AlN bulk single crystal, 半导体学报, 2009, 第 1 作者(62) Wet etching and infrared absorption of AlN bulk single crystals, Wet etching and infrared absorption of AlN bulk single crystals, 半导体学报, 2009, 第 2 作者(63) Wet etching and infrared absorption of AlN bulk single crystals, Wet etching and infrared absorption of AlN bulk single crystals, 半导体学报, 2009, 第 2 作者(64) Proton irradiation-induced defects in undoped GaSb studied by positron lifetime spectroscopy and photoluminescence, JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2009, 第 6 作者(65) InP中的深能级杂质与缺陷(续), Deep Impurities and Defects in InP (Continued), 微纳电子技术, 2008, 第 2 作者(66) Investigation of native defects and property of bulk zno single crystal grown by a closed chemical vapor transport method, JOURNAL OF CRYSTAL GROWTH, 2008, 第 2 作者(67) 多晶AlN光学性质研究, Optical Characteristics of Poly- crystalline AIN, 光散射学报, 2008, 第 4 作者(68) 磷扩散氧化锌单晶的性质, Characterization of Phosphorus Diffused ZnO Bulk Single Crystals, 半导体学报, 2008, 第 3 作者(69) Characterization of Phosphorus Diffused ZnO Bulk Single Crystals, 半导体学报, 2008, 第 3 作者(70) 铟掺杂ZnO体单晶的生长及其性质, Bulk Single Crystal Growth and Properties of In-Doped ZnC, 半导体学报, 2008, 第 2 作者(71) Native deep level defects in ZnO single crystal grown by CVT method, SOLID STATE LIGHTING AND SOLAR ENERGY TECHNOLOGIES, 2008, 第 11 作者(72) 用正电子研究原生ZnO单晶中的缺陷, Defects Studies of As-Grown Single Crystal ZnO by Positron, 武汉大学学报:理学版, 2008, 第 6 作者(73) 高温退火处理提高半绝缘VGF-GaAs单晶的电学性能, Improvement of the Electrical Property of Semi-Insulating VGF-GaAs Through High Temperature Annealing, 半导体学报, 2008, 第 2 作者(74) 掺Sb的ZnO单晶的缺陷和性质研究, Defects and Properties of Antimony-Doped ZnO Single Crystal, 半导体学报, 2008, 第 3 作者(75) VGF法生长的低位错掺Si-GaAs单晶的缺陷和性质, Defects and Properties of Low Dislocation Si-Doped GaAs Single Crystal Grown by the VGF Method, 半导体学报, 2008, 第 2 作者(76) InP中的深能级杂质与缺陷, Deep Impurities and Defects in InP, 微纳电子技术, 2008, 第 2 作者(77) InP中深能级缺陷的产生与抑制现象, Generation and suppression of deep level defects in InP, 物理学报, 2007, 第 1 作者(78) 高温退火后非掺杂磷化铟材料的电子辐照缺陷, Electron irradiation induced defects in high temperature annealed InP single crystal, 物理学报, 2007, 第 2 作者(79) GaSb和InAs单晶衬底的晶格完整性, Lattice Perfection of GaSb and InAs Single Crystal Substrate, 半导体学报, 2007, 第 2 作者(80) Generation and suppression of deep level defects in InP, ACTA PHYSICA SINICA, 2007, 第 11 作者(81) 磷化铟中铁原子替位与填隙的热致转变及其对材料性质的影响, Thermally induced Fe atom transition from substitutional to interstitial sites in InP and its influence on material property, 物理学报, 2007, 第 1 作者(82) 空位和填隙缺陷对半绝缘InP单晶性质的影响, Influence of Vacancy and Interstitial on Material Property of Semi-Insulating InP Single Crystal, 半导体学报, 2007, 第 1 作者(83) 物理气相传输法生长大尺寸AlN晶体及其性质表征, Physical Vapor Transport Growth and Characterization of Large Bulk AIN Crystal, 半导体学报, 2007, 第 2 作者(84) 化学气相传输法大尺寸ZnO单晶生长模式控制, Growth Mode Control of Large Size ZnO Single Crystal Growth Through Chemical Vapor Transport, 半导体学报, 2007, 第 1 作者(85) 气相输运法大尺寸ZnO单晶生长的传输过程控制, Control of Vapor Transport Process of Large Size ZnO Single Crystal Growth, 半导体学报, 2007, 第 2 作者(86) ZnO单晶的缺陷及其对材料性质的影响, 半导体学报, 2006, 第 2 作者(87) 高质量InAs单晶材料的制备及其性质, Growth and Properties of High Quality InAs Single Crystals, 半导体学报, 2006, 第 1 作者(88) 半绝缘InP中深能级缺陷对电学性质的影响和缺陷的控制, Influence of Deep Level Defects on Electrical Properties and Defect Control in Semi-Insulating InP, 半导体学报, 2006, 第 1 作者(89) 升华法生长AlN体单晶初探, Study of Sublimation Crystal Growth of Bulk AlN, 半导体学报, 2006, 第 4 作者(90) 半绝缘InP的铁掺杂激活与电学补偿, 半导体学报, 2006, 第 2 作者(91) Recent research results on deep level defects in semi-insulating InP - Application to improve material quality, 2006 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS CONFERENCE PROCEEDINGS, 2006, (92) 磷化铟单晶衬底的缺陷控制和高质量表面制备, 半导体学报, 2006, 第 1 作者(93) 化学气相传输法生长ZnO单晶, Growth of ZnO Single Crystal by Chemical Vapor Transport Method, 半导体学报, 2006, 第 1 作者(94) 用正电子研究半导体材料GaSb的缺陷, Positron Annihilation Study of Defect in Semiconductor Material GaSb, 武汉大学学报:理学版, 2006, 第 3 作者(95) 化学气相传输法生长ZnO单晶及性质研究, Single Crystal Growth and Property of ZnO by Chemical Vapor Transport Method, 人工晶体学报, 2006, 第 1 作者(96) 生长条件及退火处理对磷化铟单晶结构完整性的影响, Influence of Growth and Annealing Conditions on Perfection of InP Single Crystals, 半导体学报, 2005, 第 1 作者(97) 半绝缘磷化铟中与非化学配比有关的深能级缺陷, Non-stoichiometry Related Deep Level Defects in Semi-insulating InP, 人工晶体学报, 2004, 第 1 作者(98) 高温退火处理的磷化铟中的深能级缺陷, 中国科学:E辑, 2004, 第 2 作者(99) 半绝缘磷化铟中与非化学配比有关的深能级缺陷, 人工晶体学报, 2004, 第 1 作者(100) 高温退火处理的磷化铟中的深能级缺陷, 中国科学. E辑, 技术科学, 2004, 第 2 作者(101) 高温退火非掺杂磷化铟制备半绝缘衬底的方法, 科技开发动态, 2004, 第 1 作者(102) 提高(100)晶向磷化铟单晶的成晶率和质量的研究, 人工晶体学报, 2003, 第 1 作者(103) Preparation of Semi-Insulating Material by Annealing Undoped InP, 半导体学报, 2002, 第 1 作者(104) 退火处理后非掺磷化铟的电传输特性, Electrical Transport Properties of Annealed Undoped InP, 半导体学报, 2002, 第 1 作者(105) 非原生掺杂半绝缘磷化铟(InP)及其应用对比, 科学通报, 2002, (106) 非掺半绝缘磷化铟晶片的制备及其均匀性, 半导体学报, 2002, (107) 高温退火非掺杂磷化铟制备半绝缘材料, Preparation of Semi-Insulating Material by Annealing Undoped InP, 半导体学报, 2002, 第 1 作者(108) 掺铁浓度对半绝缘磷化铟的一些性质的影响, Influence of Fe Doping Concentration on Some Properties of Semi-Insulating InP, 半导体学报, 2002, 第 1 作者(109) 非掺及掺铁磷化铟中的残留施主缺陷, Investigation of Residual Donor Defects in Undoped and Fe-Doped LEC InP, 半导体学报, 2002, 第 1 作者(110) Electrical Transport Properties of Annealed Undoped InP, 半导体学报, 2002, 第 1 作者
科研活动
科研项目
( 1 ) 高纯磷化铟多晶制备技术及晶园衬底制备, 负责人, 境内委托项目, 2020-01--2020-12( 2 ) 磷化铟材料, 负责人, 国家任务, 2019-10--2022-09( 3 ) 新型中长波红外探测器衬底GaSb和InAs单晶材料制备及应用, 负责人, 研究所自主部署, 2018-03--2020-12( 4 ) 高质量GaSb单晶衬底加工技术及红外探测应用, 负责人, 研究所自主部署, 2017-08--2018-12( 5 ) 4-6英寸InP单晶VGF生长技术, 负责人, 境内委托项目, 2017-03--2019-12( 6 ) 面向红外探测应用的GaSb单晶杂质、缺陷及物性研究, 负责人, 国家任务, 2015-01--2018-12
参与会议
(1)C-H complex defects and their influnce in InAs single crystal 2017-10-08