发表论文
(1) 深紫外计算光刻技术研究, Study on Deep Ultraviolet Computational Lithography Techniques, 激光与光电子学进展, 2022, 第 3 作者(2) 基于深度优先搜索的全芯片光源掩模优化关键图形筛选方法, Critical Pattern Selection Method for Full-Chip Source and Mask Optimization Based on Depth-First Search, 光学学报, 2022, 第 2 作者(3) 芯片制造语境下的计算光刻技术, Computational Lithography Technology Under Chip Manufacture Context, 激光与光电子学进展, 2022, 第 5 作者(4) Through-focus EUV multilayer defect compensation considering optical proximity correction, APPLIED OPTICS, 2022, 通讯作者(5) EUV光刻三维掩模成像研究进展, Research Progress on the Imaging of Three-Dimensional Mask for Extreme Ultraviolet Lithography, 激光与光电子学进展, 2022, 第 2 作者(6) 光源掩模联合优化技术研究, Research on Source and Mask Optimization, 激光与光电子学进展, 2022, 第 2 作者(7) 偏振相移点衍射干涉波像差检测技术研究, 中国激光, 2022, 第 7 作者(8) 极紫外光刻掩模缺陷检测与补偿技术研究, Research on Mask Defect Inspection and Compensation Techniques in Extreme Ultraviolet Lithography, 激光与光电子学进展, 2022, 第 2 作者(9) Unitary learning for diffractive deep neural network, OPTICS AND LASERS IN ENGINEERING, 2021, 通讯作者(10) Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling, OPTICS EXPRESS, 2021, 通讯作者(11) Design and analysis of bilayer metallic grating polarizer in deep ultraviolet band, ACTA PHYSICA SINICA, 2021, 第 5 作者(12) 深紫外双层金属光栅偏振器的设计与分析, Design and analysis of bilayer metallic grating polarizer in deep ultraviolet band, 物理学报, 2021, 第 5 作者(13) Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm, OPTICS EXPRESS, 2021, 通讯作者(14) Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase sampling, OPTICS EXPRESS, 2021, 通讯作者(15) Fast mask model for extreme ultraviolet lithography with a slanted absorber sidewall, APPLIED OPTICS, 2021, 通讯作者(16) Extreme ultraviolet phase defect characterization based on complex amplitudes of the aerial images, APPLIED OPTICS, 2021, 通讯作者(17) Source mask optimization using the covariance matrix adaptation evolution strategy, OPTICS EXPRESS, 2020, 通讯作者(18) Fast rigorous mask model for extreme ultraviolet lithography, APPLIED OPTICS, 2020, 第 2 作者(19) 极紫外光刻掩模相位型缺陷的形貌重建方法, Method for Profile Reconstruction of Phase Defects in Extreme Ultraviolet Lithography Mask, 光学学报, 2020, 第 2 作者(20) Critical pattern selection method for full-chip source and mask optimization, OPTICS EXPRESS, 2020, 通讯作者(21) Micromirror array allocation algorithm based on deconvolution, APPLIED OPTICS, 2020, 第 4 作者(22) Large-scale structured light 3D shape measurement with reverse photography, OPTICS AND LASERS IN ENGINEERING, 2020, 第 3 作者(23) 基于衍射谱分析的全芯片光源掩模联合优化关键图形筛选, Critical Pattern Selection Based on Diffraction Spectrum Analysis for Full-Chip Source Mask Optimization, 光学学报, 2020, 第 2 作者(24) Predictor of thermal aberrations via particle filter for online compensation, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019, 通讯作者(25) Jones pupil metrology of lithographic projection lens and its optimal configuration in the presence of error sources, OPTICS EXPRESS, 2019, 通讯作者(26) 穆勒矩阵成像椭偏仪误差源的简化分析方法, Simplified Analytical Method for Error Sources in Mueller Matrix Imaging Polarimeter, 光学学报, 2019, 第 2 作者(27) High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix, OPTICS COMMUNICATIONS, 2019, 通讯作者(28) 光刻投影物镜的琼斯光瞳检测方法, Jones Pupil Measurement Method of Lithographic Projection Lens, 光学学报, 2019, 第 2 作者(29) Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy (vol 17, 043505, 2018), JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2019, 第 2 作者(30) Fast optimization of defect compensation and optical proximity correction for extreme ultraviolet lithography mask, OPTICS COMMUNICATIONS, 2019, 通讯作者(31) 基于差分空间像主成分分析的偏振像差检测方法, Polarization Aberration Measurement Method Based on Principal Component Analysis of Differential Aerial Images, 光学学报, 2019, 第 2 作者(32) Fast thermal aberration model for lithographic projection lenses, OPTICS EXPRESS, 2019, 通讯作者(33) Optical fringe-reflection deflectometry with bundle adjustment, OPTICS AND LASERS IN ENGINEERING, 2018, 第 2 作者(34) Modeling and optimization of lens heating effect for lithographic projector, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2018, 通讯作者(35) Optical fringe-reflection deflectometry with sparse representation, OPTICS AND LASERS IN ENGINEERING, 2018, 第 2 作者(36) Nonlinear gamma correction via normed bicoherence minimization in optical fringe projection metrology, OPTICAL ENGINEERING, 2018, 通讯作者(37) 基于改进型结构分解的极紫外光刻掩模衍射谱快速仿真方法, A Rapid Simulation Method for Diffraction Spectra of EUV Lithography Mask Based on Improved Structural Decomposition, 光学学报, 2018, 第 2 作者(38) A Rapid Simulation Method for Diffraction Spectra of EUV Lithography Mask Based on Improved Structural Decomposition, ACTA OPTICA SINICA, 2018, 第 2 作者(39) Towards gamma-effect elimination in phase measurement profilometry, OPTIK, 2018, 通讯作者(40) 基于机器学习校正的极紫外光刻含缺陷掩模仿真方法, 3D Rigorous Simulation of Defective Masks used for EUV Lithography via Machine Learning-Based Calibration, 光学学报, 2018, 第 2 作者(41) Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2018, 通讯作者(42) Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry, APPLIED OPTICS, 2017, 第 3 作者(43) 基于粒子群优化算法的光刻机光源掩模投影物镜联合优化方法, Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm, 光学学报, 2017, 第 2 作者(44) 超高NA光刻投影物镜高阶波像差检测方法, High-Order Aberration Measurement Method for Hyper-NA Lithographic Projection Lens, 光学学报, 2017, 第 3 作者(45) Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometry, APPL. OPTICS, 2017, 第 3 作者(46) Source Mask Optimization Based on Dynamic Fitness Function, 光学学报, 2016, 第 2 作者(47) Pixelated Source Mask Optimization Based on Multi Chromosome Genetic Algorithm, 光学学报, 2016, 第 2 作者(48) General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination, JOPTSOCAMAOPTIMAGESCIVIS, 2016, 第 4 作者(49) Nonsubsampled contourlet transform method for optical fringe pattern analysis in profilometry and interferometry, APPL. OPTICS, 2016, 第 1 作者(50) Radial period extraction method employing frequency measurement for quantitative collimation testing, OPT. COMMUN., 2016, 第 1 作者(51) Pixelated Source Mask Optimization Based on Multi Chromosome Genetic Algorithm, 光学学报, 2016, 第 2 作者(52) 基于分离变量法的极紫外光刻三维掩模快速仿真方法, 第十六届全国光学测试学术交流会摘要集, 2016, 第 2 作者(53) Nonsubsampled contourlet transform method for optical fringe pattern analysis in profilometry and interferometry, APPLIED OPTICS, 2016, 第 1 作者(54) Pixelated source optimization for optical lithography via particle swarm optimization, J. MICRO-NANOLITHOGR. MEMS MOEMS, 2016, 第 2 作者(55) General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination, JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 2016, 第 3 作者(56) Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image, APPLIED OPTICS, 2016, 第 3 作者(57) Radial period extraction method employing frequency measurement for quantitative collimation testing, OPTICSCOMMUNICATIONS, 2016, 第 1 作者(58) Pixelated source optimization for optical lithography via particle swarm optimization, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2016, 第 2 作者(59) Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image, APPL. OPTICS, 2016, 第 3 作者(60) Source Mask Optimization Based on Dynamic Fitness Function, 光学学报, 2016, 第 2 作者(61) 投影物镜偏振像差对光刻成像质量影响的解析分析方法, 光学学报, 2015, 第 2 作者(62) 极紫外光刻含缺陷掩模仿真模型及缺陷的补偿, 光学学报, 2015, 第 3 作者(63) Optimal shift of pattern shifting for mitigation of mask defects in extreme ultraviolet lithography, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2015, 第 2 作者(64) 基于等效膜层法的极紫外光刻含缺陷掩模多层膜仿真模型, 光学学报, 2015, 第 3 作者(65) Source Optimization using Particle Swarm Optimization Algorithm in Photolithography, OPTICAL MICROLITHOGRAPHY XXVIII, 2015, 第 2 作者(66) 基于粒子群优化算法的光刻机光源优化方法, 光学学报, 2015, 第 2 作者(67) In situ aberration measurement method using a phase-shift ring mask, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2015, 第 1 作者(68) Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality, OPTICAL MICROLITHOGRAPHY XXVIII, 2015, 第 2 作者(69) Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2015, 第 2 作者(70) Wavefront reconstruction for lateral shearing interferometry based on difference polynomial fitting, JOURNAL OF OPTICS, 2015, 第 6 作者(71) Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2014, 第 3 作者(72) Aberration measurement technique based on an analytical linear model of a through-focus aerial image, OPTICS EXPRESS, 2014, 第 3 作者(73) Aberration measurement based on principal component analysis of aerial images of optimized marks, OPTICS COMMUNICATIONS, 2014, 第 3 作者(74) 基于随机并行梯度速降算法的光刻机光源与掩模联合优化方法, 光学学报, 2014, 第 2 作者(75) 极紫外光刻含缺陷多层膜衍射谱仿真简化模型, 光学学报, 2014, 第 2 作者(76) Efficient source mask optimization using multipole source representation, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2014, 第 2 作者(77) 基于二次规划的光刻机光源优化方法, 光学学报, 2014, 第 2 作者(78) Adaptive denoising method to improve aberration measurement performance, OPTICS COMMUNICATIONS, 2013, 第 3 作者(79) Robust pixel-based source and mask optimization for inverse lithography, OPTICS AND LASER TECHNOLOGY, 2013, 第 1 作者(80) High-order aberration measurement technique based on a quadratic Zernike model with optimized source, OPTICAL ENGINEERING, 2013, 第 3 作者(81) Defect parameters retrieval based on optical projection images, MODELING ASPECTS IN OPTICAL METROLOGY IV, 2013, 第 2 作者(82) Three-dimensional information security combined fringe projection with double random phase encoding, OPTICS COMMUNICATIONS, 2013, 第 1 作者(83) Analytical approach to the impact of polarization aberration on lithographic imaging, OPTICS LETTERS, 2012, 第 3 作者(84) Hilbert assisted wavelet transform method of optical fringe pattern phase reconstruction for optical profilometry and interferometry, OPTIK - INTERNATIONAL JOURNAL FOR LIGHT AND ELECTRON OPTICS, 2012, 第 1 作者(85) Two-dimensional wavelet transform for reliability-guided phase unwrapping in optical fringe pattern analysis, APPLIED OPTICS, 2012, 第 1 作者(86) A new wavelet transform for reliability-guided phase unwrapping of optical fringe patterns, OPTICS COMMUNICATIONS, 2011, 第 1 作者